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Oxidative methane conversion in dielectric barrier discharge *

Published online by Cambridge University Press:  18 February 2013

Krzysztof Krawczyk ,
Michał Młotek ,
Bogdan Ulejczyk ,
Krzysztof Pryciak  and
Krzysztof Schmidt-Szałowski
Krzysztof Krawczyk*
Affiliation:
Faculty of Chemistry, Warsaw University of Technology, Noakowskiego 3, 00-664 Warszawa, Poland
Michał Młotek
Affiliation:
Faculty of Chemistry, Warsaw University of Technology, Noakowskiego 3, 00-664 Warszawa, Poland
Bogdan Ulejczyk
Affiliation:
Faculty of Chemistry, Warsaw University of Technology, Noakowskiego 3, 00-664 Warszawa, Poland
Krzysztof Pryciak
Affiliation:
Faculty of Chemistry, Warsaw University of Technology, Noakowskiego 3, 00-664 Warszawa, Poland
Krzysztof Schmidt-Szałowski
Affiliation:
Faculty of Chemistry, Warsaw University of Technology, Noakowskiego 3, 00-664 Warszawa, Poland
*
ae-mail: [email protected]
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Abstract

A dielectric barrier discharge was used for the oxidative coupling of methane (OCM) with oxygen at the pressure of 1.2 bar. A dielectric barrier discharge (DBD) reactor was powered at the frequency of about 6 kHz. Molar ratio CH4/O2 in the inlet gas containing 50% or 25% of argon was 3, 6 and 12. The effects of temperature (110, 150 and 340 ◦C), gas flow rate, molar ratio of methane to oxygen on the overall methane and oxygen conversion and methane conversion to methanol, ethanol, hydrocarbons, carbon oxides and water were studied. In the studied system the increase of the temperature decreases the conversion of methane to methanol. The increase of the molar ratio of methane to oxygen increased the methane conversion to hydrocarbons and strongly decreased the methane conversion to alcohols. The conversion of methane to hydrocarbons increased and the conversion of methane to methanol decreased with the decrease of the gas flow rate from 2 to 1 NL/h.

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 61 , Issue 2: Topical issue: 13th International Symposium on High Pressure Low Temperature Plasma Chemistry (Hakone XIII). Edited by Nicolas Gherardi, Henryca Danuta Stryczewska and Yvan Ségui , February 2013 , 24307
Copyright
© EDP Sciences, 2013

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Footnotes

*

Contribution to the Topical Issue “13th International Symposium on High Pressure Low Temperature Plasma Chemistry (Hakone XIII)”, Edited by Nicolas Gherardi, Henryca Danuta Stryczewska and Yvan Ségui.

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