Hostname: page-component-cd9895bd7-gbm5v Total loading time: 0 Render date: 2024-12-27T06:19:52.116Z Has data issue: false hasContentIssue false

Observation of dynamic behavior of gliding arc discharge *

Published online by Cambridge University Press:  18 February 2013

Fumiaki Mitsugi*
Affiliation:
Graduate School of Science and Technology, Kumamoto University, 2-39-1 Kurokami, Kumamoto 860-8555, Japan
Jin Furukawa
Affiliation:
Imaging division, Photron Limited, 9-8 Nozaki, Osaka 530-0055, Japan
Tamiko Ohshima
Affiliation:
Department of Electrical and Electronics Engineering, Sasebo National College of Technology, 1-1 Okishin, Sasebo 857-1171, Japan
Hiroharu Kawasaki
Affiliation:
Department of Electrical and Electronics Engineering, Sasebo National College of Technology, 1-1 Okishin, Sasebo 857-1171, Japan
Toshiyuki Kawasaki
Affiliation:
Department of Mechanical and Electrical Engineering, Nippon Bunri University, 1727 Ichigi, Oita, 870-0397, Japan
Shin-ichi Aoqui
Affiliation:
Department of computer and information sciences, Sojo University, 4-22-1 Ikeda, Kumamoto 860-0082, Japan
Henryka D. Stryczewska
Affiliation:
Institute of Electrical Engineering and Electrotechnologies, Lublin University of Technology, 38A Nadbystrzycka str., 20-618 Lublin, Poland
*
Get access

Abstract

Gliding arc discharge is one of the unique plasmas of which the dynamic behavior is extremely complex in time and space. In this work, we report on time-resolved dynamic behavior of gliding arc discharge plasma in He and Ar using comparison of obtained results between high-speed camera (54 000 fps) photographs and the corresponding electrical properties. Both measurements were synchronized via an external trigger. For a gliding arc discharge in Ar 20 L/min, gliding of serpentine plasma was observed due to turbulent gas flow and reconnections of plasma path were observed. It was revealed that the applied voltage was decreased and small pulsed current flowed at the moment of the reconnection.

Type
Research Article
Copyright
© EDP Sciences, 2013

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Footnotes

*

Contribution to the Topical Issue “13th International Symposium on High Pressure Low Temperature Plasma Chemistry (Hakone XIII)”, Edited by Nicolas Gherardi, Henryca Danuta Stryczewska and Yvan Ségui.

References

Fridman, A., Nester, S., Kennedy, L.A., Saveliev, A., Mutaf-Yardimci, O., Progr. Energy Combust. Sci. 25, 211 (1999)CrossRef
Mlotek, M., Sentek, J., Krawczyk, K., Schmidt-Szalowski, K., Appl. Catal. 366, 232 (2009)CrossRef
Krawczyk, K., Ulejczyk, B., Song, H.K., Lamenta, A., Paluch, B., Schmidt-Szalowski, K., Plasma Chem. Plasma Process. 29, 27 (2009)CrossRef
Bo, Z., Yan, J., Li, X., Chi, Y., Cen, K., J. Hazard. Mater. 166, 1210 (2009)CrossRef
Yu, L., Li, X., Tu, X., Wang, Y., Lu, S., Yan, J., J. Phys.Chem. A 114, 360 (2010)CrossRef
Burlica, R., Grim, R.G., Shih, K.-Y., Balkwill, D., Locke, B.R., Plasma Processes Polym. 7, 640 (2010)CrossRef
Burlica, R., Shih, K.-Y., Locke, B.R., Ind. Eng. Chem. Res. 49, 6342 (2010)CrossRef
Du, C.M., Sun, Y.W., Zhuang, X.F., Plasma Chem. Plasma Process. 28, 523 (2008)CrossRef
Diatczyk, J., Stryczewska, H.D., Komarzyniec, G., J. Adv. Oxid. Technol. 9, 174 (2006)
Stryczewska, H.D., Diatczyk, J., Pawlat, J., J. Adv. Oxid. Technol. 14, 276 (2011)
Komarzyniec, G., Diatczyk, J., Stryczewska, H.D., J. Adv. Oxid. Technol. 9, 178 (2006)
Komarzyniec, G., Stryczewska, H.D., Diatczyk, J., Przeglad Elektrotechniczny 84, 60 (2008)
Bo, Z., Yan, J.H., Li, X.D., Chi, Y., Cheron, B., Cen, K.F., Plasma Chem. Plasma Process. 27, 691 (2007)CrossRef
Stryczewska, H.D., Komarzyniec, G., Diatczyk, J., Przeglad Elektrotechniczny 84, 170 (2008)
Diatczyk, J., Komarzyniec, G., Stryczewska, H.D., Przeglad Elektrotechniczny 84, 309 (2008)
Diatczyk, J., Stryczewska, H.D., Komarzyniec, G., Przeglad Elektrotechniczny 86, 298 (2010)
Mitsugi, F., Ikegami, T., Aoqui, S., Tashima, Y., Kawasaki, H., Nakamiya, T., Sonoda, Y., Stryczewska, H.D., Przeglad Elektrotechniczny 88, 105 (2012)
Burlica, R., Shih, K.-Y., Hnatiuc, B., Locke, B.R., Ind. Eng. Chem. Res. 50, 9466 (2011)CrossRef
Lim, M.S., Chun, Y.N., Environ. Eng. Res. 17, 89 (2012)CrossRef
Rueangjitt, N., Akarawitoo, C., Chavadej, S., Plasma Chem. Plasma Process. 32, 583 (2012)CrossRef
Liu, Y., Tian, H., Si, A., Plasma Chem. Plasma Process. 32, 597 (2012)CrossRef
Pornmai, K., Jindanin, A., Sekiguchi, H., Chavadej, S., Plasma Chem. Plasma Process. 32, 723 (2012)CrossRef
Tu, X., Gallon, H.J., Whitehead, J.C., IEEE Trans. Plasma Sci. 39, 2900 (2011)CrossRef