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Nanomechanical behavior of (1 0 0) oriented titanium thin films

Published online by Cambridge University Press:  07 March 2014

Kuraganti Vasu ,
Mamidipudi Ghanashyam Krishna  and
Kuppuswamy Anantha Padmanabhan
Kuraganti Vasu*
Affiliation:
School of Physics, University of Hyderabad, Hyderabad 500 046, India
Mamidipudi Ghanashyam Krishna
Affiliation:
School of Physics, University of Hyderabad, Hyderabad 500 046, India Centre for Nanotechnology, University of Hyderabad, Hyderabad 500 046, India
Kuppuswamy Anantha Padmanabhan
Affiliation:
Centre for Nanotechnology, University of Hyderabad, Hyderabad 500 046, India School of Engineering Sciences and Technology, University of Hyderabad, Hyderabad 500 046, India
*
ae-mail: [email protected]
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Abstract

Titanium thin films were deposited on single crystal Si (3 1 1) and polycrystalline 316 LN nuclear grade stainless steel substrates by RF magnetron sputtering. X-ray diffraction revealed that, irrespective of substrate type, films exhibit preferential growth along the (1 0 0) plane. The microstructure of the films corresponds to the zone-I type in structure zone model on both substrates. The hardness and Young's modulus of the films were extracted from load-displacement curves. The maximum values of hardness and Young's modulus were 12 and 132 GPa respectively for 220 nm thin film on SS substrate. The electrical resistivity data revealed that the films are metallic in nature and the resistivity is lower in the case of the 220 nm thickness film, on both substrates. The observed changes in mechanical and electrical properties can be correlated with variations in the microstructure of Ti films.

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 65 , Issue 3 , March 2014 , 30302
Copyright
© EDP Sciences, 2014

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