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Low frequency noise modeling of polycrystalline silicon thin-film transistors

Published online by Cambridge University Press:  08 July 2009

W. Deng ,
P. Liang  and
C. Wei
W. Deng*
Affiliation:
Department of Electronic Engineering, College of Information Science and Technology, Jinan University, Guangzhou 510630, P.R. China
P. Liang
Affiliation:
South China University of Technology, Guangzhou 510640, P.R. China
C. Wei
Affiliation:
South China University of Technology, Guangzhou 510640, P.R. China
*
[email protected]
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Abstract

A modified and improved low frequency model for polycrystalline silicon thin-film transistors (poly-Si TFTs) is developed in this paper. For small grain size poly-Si TFTs, based on carrier number fluctuations, an improvement of the standard low frequency noise model has been investigated to explain the noise characteristics of poly-Si TFTs. An exponential energy distribution for interface density of states is employed to model the interface trap capacitance. For large grain size devices, mobility fluctuations related to fluctuations of the grain boundary charges is used to describe the excess subthreshold noise. The anomalous noise increase behavior of poly-Si TFTs when operated in the kink regime is also studied and modeled. The proposed model and the experimental data agree well over a wide range of operation regimes.

Keywords

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 48 , Issue 1 , October 2009 , 10303
Copyright
© EDP Sciences, 2009

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