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In situ diagnostic of etch plasmas for process controlusing quantum cascade laser absorption spectroscopy

Published online by Cambridge University Press:  11 December 2009

N. Lang ,
J. Röpcke ,
S. Wege  and
A. Steinbach
N. Lang*
Affiliation:
Leibniz Institute for Plasma Science and Technology Greifswald, F.-Hausdorff-Str. 2, 17489 Greifswald, Germany
J. Röpcke
Affiliation:
Leibniz Institute for Plasma Science and Technology Greifswald, F.-Hausdorff-Str. 2, 17489 Greifswald, Germany
S. Wege
Affiliation:
Qimonda Dresden, Königsbrücker Str. 180, 01099 Dresden, Germany
A. Steinbach
Affiliation:
Qimonda Dresden, Königsbrücker Str. 180, 01099 Dresden, Germany
*
[email protected]
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Abstract

The combination of quantum cascade lasers and infra red absorption spectroscopy (QCLAS) opens up new possibilities for plasma process monitoring and control. First measurements are reported with an especially designed quantum cascade laser arrangement for application in semiconductor industrial environments to track the approach for in situ process control in silicon etch plasmas. In gas mixtures with N2 and in microwave (MW) plasmas at pressures below 30 Pa concentrations of C4F6 and of SiF4 were measured simultaneously online for the first time. It could be demonstrated, that using quantum cascade lasers (QCL) it is possible to control ex situ mass flow controllers (MFC) based on in situ measured species concentrations in the gas phase and in the MW plasma bulk.

Keywords

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 49 , Issue 1: 17th International Colloquium on Plasma Processes (CIP 2009) , January 2010 , 13110
Copyright
© EDP Sciences, 2009

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References

Röpcke, J., Welzel, S., Lang, N., Hempel, F., Gatilova, L., Guaitella, O., Rousseau, A., Davies, P.B., Appl. Phys. B 92, 335 (2008) CrossRef
N. Lang, J. Röpcke, A. Steinbach, S. Wege, IEEE Trans. Plasma Sci. 37 (Part 2) (2009)
Stancu, G.D., Lang, N., Röpcke, J., Reinicke, M., Steinbach, A., Wege, S., Chem. Vap. Deposition 13, 351 (2007) CrossRef
Ohl, A., J. Phys. IV France 8, 7 (1998), http://webbook.nist.gov/cgi/cbook.cgi?Scan=cob2554&Type=IR CrossRef
http://webbook.nist.gov/chemistry/form-ser.html