Hostname: page-component-cd9895bd7-dk4vv Total loading time: 0 Render date: 2024-12-27T07:05:48.881Z Has data issue: false hasContentIssue false

Formations of negative ions in Sf6/N2 mixtures and their transport at atmospheric pressure *

Published online by Cambridge University Press:  15 February 2013

Yui Okuyama
Affiliation:
Department of Experimental Physics, Comenius University, Mlynska dolina F2, 84248 Bratislava, Slovakia Graduate School, Chiba Institute of Technology, Tsudanuma, Narashino, Chiba 275-0016, Japan
Martin Sabo
Affiliation:
Department of Experimental Physics, Comenius University, Mlynska dolina F2, 84248 Bratislava, Slovakia
Haruo Itoh
Affiliation:
Graduate School, Chiba Institute of Technology, Tsudanuma, Narashino, Chiba 275-0016, Japan
Štefan Matejčík*
Affiliation:
Department of Experimental Physics, Comenius University, Mlynska dolina F2, 84248 Bratislava, Slovakia
*
Get access

Abstract

Formation of negative ions initiated by interaction of thermal electrons and in the corona discharge (CD) in N2 with small admixture of SF6; was studied using the ion mobility spectrometry- orthogonal acceleration time-of-flight mass spectrometry (IMS-oaTOF) at atmospheric pressure. The negative ions have been analyzed by the ion mobility spectrometry and mass spectrometry (IMS-MS) and two-dimensional spectra (2D IMS-MS) have been recorded. We discuss the mechanisms of the negative ion formation in the N2/SF6 mixtures (0.003-0.018%) as well as the transport parameters of the ions in these mixtures. The values of the reduced ion mobilities of negative ions formed in these mixtures were determined (2.43 cm2/V s for HF2 (HF)n, 2.32 cm2/V s for NO3 (HF)n, 2.08 cm2/V s for SF5, 2.01 cm2/V s for SOF5, 2.00 for SOF4 1.99 cm2/V s for SF6, 1.83 cm2/V s for SOF5(H2O)n and 1.73 for SOF5(H2O)n(HF)m). The assignment of the ion mobility peaks was performed on the basis of the 2D IMS-MS spectra.

Type
Research Article
Copyright
© EDP Sciences, 2013

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Footnotes

*

Contribution to the Topical Issue “13th International Symposium on High Pressure Low Temperature Plasma Chemistry (Hakone XIII)”, Edited by Nicolas Gherardi, Henryca Danuta Stryczewska and Yvan Ségui.

References

Christophorou, L.G., Olthoff, J.K., (Eds.), Gaseous dielectric IX, (Kluwer Academic/Plenum Publishers, New York, 2001)CrossRefGoogle Scholar
Christophorou, L.G., Olthoff, J.K., Green, D.S., NIST Technical Note 1425 (1997)
Morrow, R., IEEE Trans. Plasma Sci. 14, 234 (1986)CrossRef
Christophorou, L.G., Olthoff, J.K., J. Phys. Chem. Ref. Data 29, 267 (2000)CrossRef
Edelson, D., McAffe, K.B., J. Chem. Phys. 19, 1311 (1951)CrossRef
Christophorou, L.G., Van Brunt, R.J., IEEE Trans. Dielectr. Electr. Insul. 2, 952 (1995)CrossRef
Fleming, I.A., Rees, J.A., J. Phys. B 2, 777 (1969)CrossRef
Naidu, M.S., Prasad, A.N., J. Phys. D: Appl. Phys. 3, 951 (1970)CrossRef
de Urquijo-Carmona, J., J. Phys. D: Appl. Phys. 16, 1603 (1983)CrossRef
Patterson, P.L., J. Chem. Phys. 53, 696 (1970)CrossRef
Sauers, I., Harman, G., J. Phys. D: Appl. Phys. 25, 761 (1992)CrossRef
de Urquijo-Carmona, J., Alvarez, I., Martinez, H., Cisneros, C., J. Phys. D: Appl. Phys. 24, 664 (1991)CrossRef
Sauers, I., Harman, G., J. Phys. D: Appl. Phys. 25, 774 (1992)CrossRef
Lakdawala, V.K., Moruzzi, J.L., J. Phys. D 13, 1439 (1980)CrossRef
Hinojosa, G., de Urquijo, J., J. Phys. D: Appl. Phys. 36, 2510 (2003)CrossRef
Phelps, A.V., Van Brunt, R.J., J. Appl. Phys. 64, 4269 (1988)CrossRef
Sabo, M., Matuška, J., Matejčík, Š., Talanta 85, 400 (2011)CrossRef
Sabo, M., MatejčÍk, Š., Anal. Chem. 84, 5327 (2012)CrossRef
Guilhaus, M., Selby, D., Mlynsky, V., Mass Spec. Rev. 19, 65 (2000)3.0.CO;2-E>CrossRef
Smith, D., Španĕl, P., Matejčík, Š., Stamatovic, A., Märk, T.D., Jaffke, T., Illenberger, E., Chem. Phys. Lett. 240, 481 (1995)CrossRef
Christophorou, L.G., Olthoff, J.K., Int. J. Mass Spectrom. 205, 27 (2001)CrossRef
Van Brunt, R.J., Herron, T.J., IEEE Trans. Electr. Insul. 75 (1990)
Sauers, I., Electr. Insul. 21, 105 (1986)CrossRef
Kline, L.E., IEEE Trans. Plasma Sci. 14, 145 (1986)CrossRef