Hostname: page-component-7479d7b7d-m9pkr Total loading time: 0 Render date: 2024-07-08T11:09:45.493Z Has data issue: false hasContentIssue false
  • English
  • Français

Fluid modeling of a microwave micro-plasma at atmospheric pressure

Published online by Cambridge University Press:  26 November 2009

J. Gregório ,
C. Boisse-Laporte  and
L. L. Alves
J. Gregório*
Affiliation:
Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, 1049-001 Lisboa, Portugal Laboratoire de Physique des Gaz et des Plasmas, Université Paris-Sud/CNRS, 91405 Orsay, France
C. Boisse-Laporte
Affiliation:
Laboratoire de Physique des Gaz et des Plasmas, Université Paris-Sud/CNRS, 91405 Orsay, France
L. L. Alves
Affiliation:
Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, 1049-001 Lisboa, Portugal
*
[email protected]
Get access

Abstract

This paper presents the modeling of an argon micro-plasma produced by microwaves (2.45 GHz) at atmospheric pressure. The study uses a one-dimensional stationary fluid-type code that solves the transport equations for electrons, positive ions Ar+ and Ar+2, and the electron mean energy, together with Poisson's equation for the space-charge electrostatic field, Maxwell's equations for the electromagnetic excitation field and the gas thermal energy equation. The model uses a simple kinetic scheme for Ar that includes the ground state, an excited state representing the lumped 4s levels, and two ionization states associated to the atomic and the molecular ions. The ions are assumed to be in thermal equilibrium with the neutral gas, having the same temperature profile.

Keywords

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 49 , Issue 1: 17th International Colloquium on Plasma Processes (CIP 2009) , January 2010 , 13102
Copyright
© EDP Sciences, 2009

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Iza, F., Kim, G.J., Lee, S.M., Lee, J.K., Walsh, J.L., Zhang, Y.T., Kong, M.G., Plasma Process. Polym. 5, 322 (2008) CrossRef
Foest, R., Schmidt, M., Becker, K., Int. J. Mass. Spectrom. 248, 87 (2006) CrossRef
Gregório, J., Leroy, O., Leprince, P., Alves, L.L., Boisse-Laporte, C., IEEE Trans. Plasma Sci. 37, 797 (2009) CrossRef
http://www.cst.com/
Yanguas, A., Cotrino, J., Alves, L.L., J. Phys. D: Appl. Phys. 38, 1588 (2005) CrossRef
D.M. Manos, D.L. Flamm, Plasma Etching – An Introduction (Academic Press, 1989)
E.W. McDaniel, E.A. Mason, The Mobility and Diffusion of Ions in Gases (Wiley, 1973)
Salabas, A., Gousset, G., Alves, L.L., Plasma Sources Sci. Technol. 11, 448 (2002) CrossRef
Alves, L.L., Plasma Sources Sci. Technol. 16, 557 (2007) CrossRef
Castaños-Martinez, E., Kabouzi, Y., Makasheva, K., Moisan, M., Phys. Rev. E 70, 066405 (2004) CrossRef
Kabouzi, Y., Graves, D.B., Castaños-Martinez, E., Moisan, M., Phys. Rev. E 75, 016402 (2007) CrossRef
Handbook of Chemistry and Physics, edited by D.R. Lide (CRC Press, 2003)