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Determination of the electron mean free path in the 1–1.8 eV energy range inthin gold layers using ballistic electron emission microscopy

Published online by Cambridge University Press:  15 March 1999

R. Coratger ,
C. Girardin ,
R. Pechou ,
F. Ajustron  and
J. Beauvillain
R. Coratger*
Affiliation:
CEMES/CNRS, 29 rue J. Marvig, B.P. 4347, 31055 Toulouse Cedex 4, France
C. Girardin
Affiliation:
CEMES/CNRS, 29 rue J. Marvig, B.P. 4347, 31055 Toulouse Cedex 4, France
R. Pechou
Affiliation:
CEMES/CNRS, 29 rue J. Marvig, B.P. 4347, 31055 Toulouse Cedex 4, France
F. Ajustron
Affiliation:
CEMES/CNRS, 29 rue J. Marvig, B.P. 4347, 31055 Toulouse Cedex 4, France
J. Beauvillain
Affiliation:
CEMES/CNRS, 29 rue J. Marvig, B.P. 4347, 31055 Toulouse Cedex 4, France
*
[email protected]
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Abstract

Electron mean free path (λa) has been investigated using BallisticElectron Emission Microscopy (BEEM). Using the average collector current computed fromlarge scale BEEM images and a model in which the current exponentially decreases interms of metal thickness, a constant value of λa = 11 nm has been calculatedin the 1–1.8 eV electron energy range. On small scale images, the study ofwell-defined BEEM doMayns shows that either λa or the interface transmissionfactor (or both) may differ from their average values. These local variations from onegrain to another are interpreted as interface defects and channeling of the electronbeam due to the electronic and crystallographic of the gold layer.

Keywords

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 5 , Issue 3 , March 1999 , pp. 237 - 242
Copyright
© EDP Sciences, 1999

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