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Analytical calculation of site and surface reaction probabilities of SiHx radicals in PECVD process

Published online by Cambridge University Press:  20 March 2013

Oumelkheir Babahani ,
Fethi Khelfaoui  and
Mohammed Tayeb Meftah
Oumelkheir Babahani
Affiliation:
Laboratoire LRPPS, Faculté des Sciences et de la Technologie et des Sciences de la Matière, Université Kasdi Merbah Ouargla, Ouargla 30000, Algeria
Fethi Khelfaoui*
Affiliation:
Laboratoire LRPPS, Faculté des Sciences et de la Technologie et des Sciences de la Matière, Université Kasdi Merbah Ouargla, Ouargla 30000, Algeria
Mohammed Tayeb Meftah
Affiliation:
Laboratoire LRPPS, Faculté des Sciences et de la Technologie et des Sciences de la Matière, Université Kasdi Merbah Ouargla, Ouargla 30000, Algeria
*
ae-mail: [email protected]; [email protected]
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Abstract

In this work we present a theoretical and mathematical relationship which calculates the site reaction probability (SRP) of the sticking on (Si-) dangling bonds (DB) or the SRP to abstract H from (Si-H) bonds, on the a-Si:H surface. The results are in agreement with those obtained by the Monte Carlo simulation. Using these probabilities allowed us to compute the surface reaction probability of SiHx radicals on a-Si:H for several values of the temperature. The surface reaction probability (SFRP) results show also an excellent agreement with other works found in the literature.

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 62 , Issue 1 , April 2013 , 10301
Copyright
© EDP Sciences, 2013

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References

Valipa, M.S., Aydil, E.S., Maroudas, D., Surf. Sci. 572, L339 (2004)CrossRef
Perrin, J., Leroy, O., Bordage, M.C., Contrib. Plasma Phys. 36, 3 (1996)CrossRef
Gorbachev, Y.E., Zetevakhin, M.A., Kaganovich, I.D., J. Tech. Phys. 41, 1247 (1996)
Bouhekka, A., Kebab, A., Sib, J.D., Bouizem, Y., Benbekhti, M., Chahed, L., J. Assoc. Arab Univ. Basic Appl. Sci. 12, 11 (2012)
Nakamura, K.G., Chem. Phys. Lett. 285, 21 (1998)CrossRef
Gupta, A., Yang, H., Parsons, G.N., Surf. Sci. 496, 307 (2002)CrossRef
Matsuda, A., J. Non-Cryst. Solids 338–340, 1 (2004)CrossRef
Perrin, J., Takeda, Y., Hirano, N., Takeuchi, Y., Matsuda, A., Surf. Sci. 210, 114 (1989)CrossRef
Matsuda, A., Nomoto, K., Takeuchi, Y., Suzuki, A., Yuuki, A., Perrin, J., Surf. Sci. 227, 50 (1990)CrossRef
Perrin, J., Broekhuizen, T., Appl. Phys. Lett. 50, 433 (1987)CrossRef
Kessels, W.M.M., Hoefnagels, J.P.M., Van den Oever, P.J., Barrell, Y., Van de Sanden, M.C.M., Surf. Sci. 547, L865 (2003)CrossRef
Doughty, D.A., Doyle, J.R., Lin, G.H., Gallagher, A., J. Appl. Phys. 67, 6220 (1990)CrossRef
Doyle, J.R., Doughty, D.A., Gallagher, A., J. Appl. Phys. 71, 4771 (1992)CrossRef
Shimizu, S., Kondo, M., Matsu, A., in Solar Cells – Thin-Film Technologies, edited by Kosyachenko, L.A. (InTec, 2011)Google Scholar
Von Keudell, A., Abelson, J.R., Phys. Rev. B 59, 5791 (1999)CrossRef
Ramalingam, S., Maroudas, D., Aydil, E.S., Walch, S.P., Surf. Sci. 418, L8 (1998)CrossRef
Chitour, C.E., Physico-chimie des surface l’adsorption gaz-solide et liquide-solide (Alger: Office des publications universitaires, 2004)Google Scholar
Bisson, R., Ph.D. thesis, École polytechnique, Palaiseau France, 2004
Bisson, R., Philippe, L., Châtelet, M., Surf. Sci. 600, 4454 (2006)CrossRef
Hoefnagels, J.P.M., Stevens, A.A.E., Boogaarts, M.G.H., Kessels, W.M.M., Van de Sanden, M.C.M., Chem. Phys. Lett. 360, 189 (2002)CrossRef
Hoefnagels, J.P.M., Barrell, Y., Kessels, W.M.M., Van de Sanden, M.C.M., J. Appl. Phys. 96, 4094 (2004)CrossRef
Kessels, W.M.M., Barrell, Y., Van den Oever, P.J., Hoefnagels, J.P.M., Van den Sanden, M.C.M., in MRS Online Proceedings Library 762, A9.3 (2003)
Von Keudell, A., Plasma Source. Sci. Technol. 9, 455 (2000)CrossRef
Perrin, J., J. Vac Sci. Technol. A: Vac. Surf. Films 16, 278 (1998)CrossRef