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Two-dimensional modelling of CH4-H2 radio-frequency discharges for a-C:H deposition

Published online by Cambridge University Press:  15 November 2001

O. Leroy ,
H. Videlot  and
J. Jolly
O. Leroy*
Affiliation:
Laboratoire de Physique des Gaz et des Plasmas, Université Paris XI, bâtiment 212, 91405 Orsay Cedex, France
H. Videlot
Affiliation:
Laboratoire de Physique et Technologie des Plasmas, École Polytechnique, 91128 Palaiseau Cedex, France
J. Jolly
Affiliation:
Laboratoire de Physique et Technologie des Plasmas, École Polytechnique, 91128 Palaiseau Cedex, France
*
[email protected]
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Abstract

A two-dimensional numerical code, previously developed for the modelling of a-Si:H deposition in a SiH4/H2 radio frequency cylindrical PECVD reactor, has been modified in order to perform the modelling of CH4/H2 mixtures in the same experimental configuration. This model, which includes electrical and chemical modules, takes into account the transport and the chemistry of the charged and neutral species. The results of the models have been compared to measurements. The calculated electrical power coupled to the plasma and the self-bias voltages are compared to the experimental ones. The calculated radical densities are compared to those measured by threshold ionization mass spectroscopy at the substrate centre. Moreover, the calculated radial distribution of the deposition rate is compared to profilometry measurements. Eventually, results obtained here in CH4/H2 are compared with those previously obtained in SiH4/H2 plasmas under similar experimental conditions.

Keywords

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 16 , Issue 2 , November 2001 , pp. 121 - 130
Copyright
© EDP Sciences, 2001

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