Hostname: page-component-78c5997874-ndw9j Total loading time: 0 Render date: 2024-11-09T07:46:46.970Z Has data issue: false hasContentIssue false
  • English
  • Français

Optical properties and thermal stability of alumina films grown by pulsed laser deposition

Published online by Cambridge University Press:  03 October 2013

Priyanka Nayar  and
Atul Khanna
Priyanka Nayar
Affiliation:
Department of Physics, Guru Nanak Dev University, Amritsar, Punjab 143005, India
Atul Khanna*
Affiliation:
Department of Physics, Guru Nanak Dev University, Amritsar, Punjab 143005, India
*
a e-mail: [email protected]
Get access

Abstract

Thin films of aluminum oxide of thickness 293–433 nm were grown on fused silica substrates by pulsed laser deposition (PLD) of an alumina target with KrF excimer laser radiation. The effects of oxygen background pressure (0.5–50 Pa) and substrate temperature of room temperature to 800 °C were investigated on thickness, crystal-structure, optical properties and thermal stability of alumina films. It was found that PLD grows a weakly crystalline aluminum oxide film at in situ substrate temperature of 800 °C and oxygen background pressure of 5 Pa. Post-deposition annealing studies of amorphous alumina sample prepared at in situ temperature of 600 °C found that crystallization starts at 800 °C and forms δ alumina phase.

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 64 , Issue 1 , October 2013 , 10301
Copyright
© EDP Sciences, 2013

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Tadanaga, K., Yamaguchi, N., Uraoka, Y., Matsuda, A., Minami, T., Tatsumisago, M., Thin Solid Films 516, 4526 (2008)CrossRef
Yamaguchi, A., Hotta, K., Teramae, N., Anal. Chem. 81, 105 (2009)CrossRef
Kim, S.H., Kim, C.E., Oh, Y.J., J. Mater. Sci. Lett. 16, 257 (1997)CrossRef
Levin, I., Brandon, D., J. Am. Ceram. Soc. 81, 1995 (1998)CrossRef
Santos, P.S., Santos, H.S., Toledo, S.P., Mater. Res. 3, 104 (2000)CrossRef
Jiang, K., Sarakinos, K., Konstantinidis, S., Schneider, J.M., J. Phys. D: Appl. Phys. 43, 325202 (2010)CrossRef
Wallin, E., Selinder, T.I., Elfwing, M., Helmersson, U., Europhys. Lett. 82, 36002 (2008)CrossRef
Kohara, T., Tamagaki, H., Ikari, Y., Fujii, H., Surf. Coat. Technol. 185, 166 (2004)CrossRef
Ruppi, S., Int. J. Refract. Met. Hard Mater. 23, 306 (2005)CrossRef
Trinh, D.H., Back, K., Pozina, G., Blomqvist, H., Selinder, T., Collin, M., Reineck, I., Hultman, L., Högberg, H., Surf. Coat. Technol. 203, 1682 (2009)CrossRef
Eklund, P., Sridharan, M., Sillassen, M., Bøttiger, J., Thin Solid Films 516, 7447 (2008)CrossRef
Murray, J., Song, K., Huebner, W., O’Keefe, M., Mater. Lett. 74, 12 (2012)CrossRef
Nakao, S., Jin, P., Music, D., Helmersson, U., Ikeyama, M., Miyagawa, Y., Miyagawa, S., Surf. Coat. Technol. 158–159, 534 (2002)CrossRef
Kelly, P.J., Arnell, R.D., J. Vac. Sci. Technol. A 17, 945 (1999)CrossRef
Khanna, A., Bhat, D.G., Surf. Coat. Technol. 201, 168 (2006)CrossRef
Cremer, R., Reichert, K., Neuschutz, D., Erkens, G., Leyendecker, T., Surf. Coat. Technol. 163, 157 (2003)CrossRef
Zywitzki, O., Hoetzsch, G., Fietzke, F., Goedicke, K., Surf. Coat. Technol. 82, 169 (1996)CrossRef
Schneider, J.M., Sproul, W.D., Matthews, A., Surf. Coat. Technol. 98, 1473 (1998)CrossRef
Koinuma, H., Aiyer, H., Matsumoto, Y., Sci. Technol. Adv. Mater. 1, 1 (2000)CrossRef
Wu, N.J., Chen, Y.S., Fan, J.Y., Ignatiev, A., J. Appl. Phys. 83, 4980 (1998)CrossRef
Ferré, F.G., Bertarelli, E., Chiodoni, A., Carnelli, D., Gastaldi, D., Vena, P., Beghi, M.G., Di Fonzo, F., Acta Mater. 61, 2662 (2013)CrossRef
Music, D., Nahif, F., Sarakinos, K., Friederichsen, N., Schneider, J.M., Appl. Phys. Lett. 98, 111908 (2011)CrossRef
Sarakinos, K., Music, D., Nahif, F., Jiang, K., Braun, A., Zilkens, C., Schneider, J.M., Physica Status Solidi (RRL) 4, 154 (2010)CrossRef
Balakrishnan, G., Kuppusami, P., Sundari, S.T., Thirumurugesan, R., Ganesan, V., Mohandas, E., Sastikumar, D., Thin Solid Films 518, 3898 (2010)CrossRef
Cibert, C., Hidalgo, H., Champeaux, C., Tristant, P., Tixier, C., Desmaison, J., Catherinot, A., Thin Solid Films 516, 1290 (2008)CrossRef
Gottmann, J., Kreutz, E.W., Surf. Coat. Technol. 116–119, 1189 (1999)CrossRef
Pillonnet, A., Garapon, C., Champeaux, C., Bovier, C., Brenier, R., Jaffrezic, H., Mugnier, J., Appl. Phys. A 69, S735 (1999)CrossRef
Hirschauer, B., Soderholm, S., Chiaia, G., Karlsson, U.O., Thin Solid Films 305, 243 (1997)CrossRef
Jelinek, M., Eason, R.W., Lancok, J., Anderson, A.A., Grivas, C., Fotakis, C., Jastrabik, L., Flory, F., Rigneault, H., Thin Solid Films 322, 259 (1998)CrossRef
Gonzalo, J., Key, P.H., Schmidt, M.J.J., Laser Physics 8, 265 (1998)
Anderson, A.A., Eason, R.W., Jelinek, M., Grivas, C., Lane, D., Rogers, K., Hickey, L.M.B., Fotakis, C., Thin Solid Films 300, 68 (1997)CrossRef
Di Fonzo, F., Tonini, D., Li Bassi, A., Casari, C.S., Beghi, M.G., Bottani, C.E., Gastaldi, D., Vena, P., Contro, R., Appl. Phys. A 93, 765 (2008)CrossRef
Eklund, P., Sridharan, M., Singh, G., Bøttiger, J., Plasma. Processes Polym. 9, S907 (2009)CrossRef
Musil, J., Blažek, J., Zeman, P., Prokšova, Š., Šašek, M., Čerstvý, R., Appl. Surf. Sci. 257, 1058 (2010)CrossRef
Edlmayr, V., Moser, M., Walter, C., Mitterer, C., Surf. Coat. Technol. 204, 1576 (2010)CrossRef
Baba, S., Mori, I., Nakano, T., Vacuum 59, 531 (2000)CrossRef
Swanepoel, R., J. Phys. E: Sci. Instr. 16, 1214 (1983)CrossRef
Lin, C.H., Wang, H.L., Hon, M.H., Surf. Coat. Technol. 90, 102 (1997)CrossRef
Powder Diffraction File # 10-042, Newtown Square, PA, USA, ICDD.
Powder Diffraction File # 46-1131, Newtown Square, PA, USA, ICDD.
Engelhart, W., Dreher, W., Eibl, O., Schier, V., Acta Mater. 59, 7757 (2011)CrossRef
Mathhews, S., Taliana, F., James, B., Surf. Coat. Technol. 212, 109 (2012)CrossRef