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Electrochemical production of Fe-Cu films: determinationof the deposition potentials and their effect on microstructural and magnetic properties

Published online by Cambridge University Press:  11 November 2009

Ali Karpuz ,
Hakan Kockar  and
Mursel Alper
Ali Karpuz
Affiliation:
Physics Department, Science & Literature Faculty, Balikesir University, Balikesir, Turkey
Hakan Kockar*
Affiliation:
Physics Department, Science & Literature Faculty, Balikesir University, Balikesir, Turkey
Mursel Alper
Affiliation:
Physics Department, Science & Literature Faculty, Uludag University, Bursa, Turkey
*
[email protected]
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Abstract

Fe-Cu alloys were grown on polycrystalline titanium substrates after determining the suitable deposition potentials. Based on the results obtained from cyclic voltammetry curves, a potential region between –1.8 V and –2.3 V vs. saturated calomel electrode (SCE) was selected. During growth, the electrochemical characterizations of the films were made by recording the current-time transients. The structure of films becomes more brittle with the increase of the deposition potential over –2.3 V vs. SCE due to extreme hydrogen liberation from cathode surface. The structural analysis by the X-ray diffraction demonstrated that the films have a typical body centered cubic of $\alpha $ -Fe preferentially grown in the (211) direction. The grain sizes, lattice parameters and interplanar spacings were also calculated. Energy dispersive X-ray spectroscopy measurements demonstrated that the ratio of Fe:Cu was almost the same. The magnetic analysis by vibrating sample magnetometer indicated that the coercivity of the films was slightly affected by the deposition potential.

Keywords

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 48 , Issue 3 , December 2009 , 30504
Copyright
© EDP Sciences, 2009

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