Hostname: page-component-cd9895bd7-7cvxr Total loading time: 0 Render date: 2024-12-27T06:26:26.862Z Has data issue: false hasContentIssue false

Decomposition of carbon tetrachloride in the reactor of dielectric barrier discharge with different power supplies *

Published online by Cambridge University Press:  15 February 2013

Bogdan Ulejczyk*
Affiliation:
Faculty of Chemistry, Warsaw University of Technology, Noakowskiego 3, 00-664 Warszawa, Poland
Krzysztof Krawczyk
Affiliation:
Faculty of Chemistry, Warsaw University of Technology, Noakowskiego 3, 00-664 Warszawa, Poland
Michał Młotek
Affiliation:
Faculty of Chemistry, Warsaw University of Technology, Noakowskiego 3, 00-664 Warszawa, Poland
Krzysztof Schmidt-Szałowski
Affiliation:
Faculty of Chemistry, Warsaw University of Technology, Noakowskiego 3, 00-664 Warszawa, Poland
Łukasz Nogal
Affiliation:
Faculty of Electrical Engineering, Warsaw University of Technology, Pl. Politechniki 1, 00-661 Warszawa, Poland
Bolesław Kuca
Affiliation:
Faculty of Electrical Engineering, Warsaw University of Technology, Pl. Politechniki 1, 00-661 Warszawa, Poland
*
Get access

Abstract

The decomposition of CCl4 in air was investigated at atmospheric pressure in a new type of dielectric barrier discharge reactor. The reactor was powered by three different power supplies: pulsed of low frequency (150–600 Hz), pulsed of 15 kHz frequency with regulated current pulse duration and AC of 6.8 kHz frequency. Maximum conversion of CCl4 depended on the power supply. 64, 87 and 98% were the maximum achieved conversions of CCl4 for tested power supplies. The products of CCl4 conversion and energy consumption depended on power supply system. The chlorine gas was always the main product obtained from CCl4. The smallest energy consumption (~0.3 kWh per mol CCl4 converted) was achieved for pulsed power supply system of low frequency. It was 26 and 230 times less than energy consumption (for similar overall CCl4 conversion) in AC of 6.8 kHz frequency and pulsed of 15 kHz frequency respectively.

Type
Research Article
Copyright
© EDP Sciences, 2013

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Footnotes

*

Contribution to the Topical Issue “13th International Symposium on High Pressure Low Temperature Plasma Chemistry (Hakone XIII)”, Edited by Nicolas Gherardi, Henryca Danuta Stryczewska and Yvan Ségui.

References

Statistical Information and Elaborations, Environment 2011, ISSN 0867–3217, Publication available on compact disc and in Internet - www.stat.gov.pl., Central Statistical Office, Warsaw, Poland
Sun, Y., Chmielewski, A.G., Bułka, S., Zimek, Z., Plasma Chem. Plasma Process. 26, 347 (2006)CrossRef
Nichipor, H., Dashouk, E., Chmielewski, A.G., Zimek, Z., Bulka, S., Radiat. Phys. Chem. 57, 519 (2000)CrossRef
Koch, M., Cohn, D.R., Patrick, R.M., Schuetze, M.P., Bromberg, L., Reilly, D., Hadidi, K., Thomas, P., Falkos, P., Environ. Sci. Technol. 29, 2946 (1995)CrossRef
Penetrante, B.M., Hsiao, M.C., Bardsley, J.N., Merrit, B.T., Vogtlin, G.E., Wallman, P.H., Kuthi, A., Burkhart, C.P., Bayless, J.R., Phys. Lett. A 209, 69 (1995)CrossRef
Penetrante, B.M., Bardsley, J.N., Hsiao, M.C., Jpn J. Appl. Phys. 36, 5007 (1997)CrossRef
Penetrante, B.M., Hsiao, H.C., Bardsley, J.N., Merritt, B.T., Vogtlin, G.E., Kuthi, A., Burkhart, C.P., Bayless, J.R., Plasma Sources Sci. Technol. 6, 251 (1997)CrossRef
Harada, N., Matsuyama, T., Yamamoto, H., J. Electrostat. 64, 43 (2007)CrossRef
Kirkpatrick, M.J., Finney, W.C., Locke, B.R., Plasmas Polym. 8, 165 (2003)CrossRef
Han, S.B., Oda, T., IEEE Trans. Ind. Appl. 41, 1343 (2005)CrossRef
Magureanu, M., Mandache, N.B., Parvulescu, V.I., Plasma Chem. Plasma Process. 27, 679 (2007)CrossRef
Rudolph, R., Francke, K.-P., Miessner, H., Plasma Chem. Plasma Process. 22, 401 (2002)CrossRef
Marotta, E., Ceriani, E., Shapoval, V., Schiorlin, M., Ceretta, C., Rea, M., Paradisi, C., Eur. Phys. J. Appl. Phys. 55, 13811 (2011)CrossRef
Bo, Zh., Yan, J.H., Li, X.D., Chi, Y., Cen, K.F., Cheron, B.G., Plasma Chem. Plasma Process 27,576 (2007)
Krawczyk, K., Ulejczyk, B., Plasma Chem. Plasma Process. 23, 265 (2003)CrossRef
Indarto, A., Choi, J.-W., Lee, H., Song, H.-K., Plasma Devices Oper. 14, 1 (2006)CrossRef
Krawczyk, K., Ulejczyk, B., Plasma Chem. Plasma Process. 24, 155 (2004)CrossRef
Jasiński, M., Szczucki, P., Dors, M., Mizeraczyk, J., Lubanski, M., Zakrzewski, Z., Czech. J. Phys. 50, 285 (2000)CrossRef
Jasiński, M., Dors, M., Mizeraczyk, J., Plasma Chem. Plasma Process. 29, 363 (2009)CrossRef
Krawczyk, K., Jodzis, S., Lamenta, A., Kostka, K., Ulejczyk, B., Schmidt-Szałowski, K., IEEE Trans. Plasma Sci. 39, 3203 (2011)CrossRef
Lamenta, A., Jodzis, S., Krawczyk, K., Schmidt-Szałowski, K., Pol. J. Chem. 83, 169 (2009)
Krawczyk, K., Ulejczyk, B., Song, H.K., Lamenta, A., Paluch, B., Schmidt-Szałowski, K., Plasma Chem. Plasma Process. 29, 27 (2009)CrossRef
Magureanu, M., Mandache, N.B., Hu, J., Richards, R., Florea, M., Parvulescu, V.I., Appl. Catal. B Env. 76, 275 (2007)CrossRef
Ren, L., Pan, X., Catal. Commun. 12, 1366 (2011)CrossRef
Kogelschatz, U., Plasma Chem. Plasma Process. 23, 1 (2003)CrossRef
Meiners, A., Leck, M., Abdel, B., Rev. Sci. Instrum. 81, 1135071 (2010)CrossRef
Takaki, K., Yagi, I., Fujiwara, T., IEEE Trans. Dielect. Electr. Insul. 18, 1752 (2011)CrossRef
Li, X.S., Zhu, A.M., Wang, K.J., Xu, Y., Song, Z.M., Catal. Today 98, 617 (2004)CrossRef
Michael, J.V., Lim, K.P., Kumaran, S.S., Kiefer, J.H., J. Phys. Chem. 97, 1914 (1993)CrossRef
Foglein, K.A., Szepvolgyi, J., Dombi, A., Chemosphere 50, 9 (2003)CrossRef
Lee, W.J., Chen, C.Y., Lin, W.C., Wang, Y.T., Chin, C.J.,J. Hazard. Mater. 48, 67 (1996)CrossRef
Kovacs, T., Turanyi, T., Foglein, K., Szepvolgyi, J., Plasma Chem. Plasma Process. 26, 293 (2006)CrossRef
Foglein, K.A., Szabó, P.T., Dombi, A., Szepvolgyi, J., Plasma Chem. Plasma Process. 23, 651 (2003)CrossRef
Foglein, K.A., Szabó, P.T., Babievskaya, I.Z., Szepvolgyi, J., Plasma Chem. Plasma Process. 25, 289 (2005)CrossRef
Kovacs, T., Turanyi, T., Foglein, K., Szepvolgyi, J., Plasma Chem. Plasma Process. 25, 109 (2005)CrossRef
Jodzis, S., Ind. Eng. Chem. Res. 50, 6053 (2011)CrossRef