Hostname: page-component-cd9895bd7-dzt6s Total loading time: 0 Render date: 2024-12-25T17:54:32.319Z Has data issue: false hasContentIssue false

Deactivation of yeast by dielectric barrier discharge

Published online by Cambridge University Press:  17 April 2009

N. N. Morgan
Affiliation:
Physics Department, Faculty of Science (male), Al-Azhar University, Nasr City, Cairo, Egypt
M. A. Elsabbagh
Affiliation:
Physics Department, Faculty of Science (male), Al-Azhar University, Nasr City, Cairo, Egypt
S. Desoky
Affiliation:
Microbiology Department, Faculty of Science (male), Al-Azhar University, Nasr City, Cairo, Egypt
A. A. Garamoon*
Affiliation:
Centre of Plasma Technology, Al-Azhar University, Nasr City, Cairo, Egypt
Get access

Abstract

Saccharomyces Cerevisiae (S. Cerevisiae) and Mrakia Frigida (M. Frigida) were deactivated using alternative current dielectric barrier discharge (DBD). The deactivation was done in argon and oxygen plasma under different discharge currents. It has been found that ozone and atomic oxygen play a significant role in the deactivation of S. Cerevisiae and M. Frigida when using DBD discharge, while argon ions are less important in the deactivation of the same microorganisms in argon DBD.

Keywords

Type
Research Article
Copyright
© EDP Sciences, 2009

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Lucas, A.D., Merritt, K., Hitchins, V.M., Woods, T.O., McNamee, S.G., Lyle, D.B., Brown, S.A., J. Biomed. Mater. Res. 66, 548 (2003) CrossRef
Lara, J., Fernandez, P.S., Periago, P.M., Palop, A., Innov. Food Sci. Emerg. Technol. 3, 379 (2002) CrossRef
Uemura, K., Isobe, S., AC. J. Food Eng. 53, 203 (2002) CrossRef
Oshima, T., Sato, M., Adv. Biochem. Eng. Biotechnol. 90, 113 (2004)
Noyce, J.O., Hughes, J.F., J. Electrostat. 54, 179 (2002) CrossRef
Moisan, M., Barbeau, J., Crevier, M.C., Pelletier, J., Philip, N., Saoudi, B., Pure Appl. Chem. 74, 349 (2002) CrossRef
Sato, T., Fujioka, K., Ramasamy, R., IEEE Trans. Ind. Appl. 42, 339 (2006) CrossRef
Xu, L., Liu, P., Zhan, R., Thin Solid Films 506-507, 400 (2006) CrossRef
Moisan, M., Barbeau, J., Moreau, S., Int. J. Pharm. 24, 1 (2001) CrossRef
Laroussi, M., Plasma Process. Polym. 2, 391 (2005) CrossRef
Yanzhou, S., Yuchang, Q., Ailing, N., Xudong, W., IEEE Trans. Plasma Sci. 35, 1496 (2007)
Kelly-Wintenberg, K., Hodge, A., Montie, T., J. Vac. Sci. Technol. 17, 1539 (1999) CrossRef
Gadri, B.R., Roth, J.R., Montie, T.C., Kelly-Wintenberg, K., Tsai, P.P.Y., Helfritch, D.J., Feldman, P., Sherman, D.M., Karakaya, F., Chen, Z.Y., Surf. Coat. Technol. 131, 528 (2000) CrossRef
Garamoon, A.A., Elakshar, F.F., Nossair, A.M., Kotb, E.F., Plasma Sources Sci. Technol. 11, 254 (2002) CrossRef
Laroussi, M., Plasma Process. Polym. 2, 391 (2005) CrossRef
Choi, J., Han, I., Baik, H., J. Electrost. 64, 17 (2006) CrossRef
Yu, H., Xiu, Z., Ren, C., IEEE Trans. Plasma Sci. 33, 1405 (2005)
M. Laroussi et al., New J. Phys. 5, 41.1 (2003)
Mendis, D.A., Rosenberg, M., Azam, F., IEEE Trans. Plasma Sci. 28, 1304 (2000) CrossRef
S. Desouky, M.Sc. thesis, Microbiology department, Faculty of science (male), Al-Azhar University, 2007
Katsch, H.M., Manthey, C., Dobele, H.F., Plasma Sources Sci. Technol. 12, 475 (2003) CrossRef
Franco, C., Ozone Sci. Eng. 28, 317 (2006)
Rossi, F., Kylian, O., Hasiwa, M., Plasma Process. Polym. 3, 431 (2006) CrossRef