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The Baseline Metrology System of the USNO Astrometric Interferometer

Published online by Cambridge University Press:  19 July 2016

Nicholas M. Elias II  and
Donald J. Hutter
Nicholas M. Elias II
Affiliation:
United States Naval Observatory, NRL/USNO Optical Interferometer Project, AD5, 3450 Massachusetts Avenue, NW, Washington, DC 20392-5420
Donald J. Hutter
Affiliation:
United States Naval Observatory, NRL/USNO Optical Interferometer Project, AD5, 3450 Massachusetts Avenue, NW, Washington, DC 20392-5420

Abstract

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The USNO Astrometric Interferometer (USNOAI; a subarray of the Navy Prototype Optical Interferometer at Lowell Observatory) is presently under construction and expected to begin limited operations within a year. The main goal of the USNOAI observations is to provide a northern hemisphere catalog of several thousand stars with positions known to a few mas. In order to meet this requirement, a baseline laser metrology system must be employed to measure the three-dimensional motions of the baselines with an accuracy better than ~ 0.1 μm. The metrology scheme, as presently conceived, represents the largest and most complex high-resolution laser metrology system ever attempted.

Keywords

Astrometry:Optical InterferometryOptical Interferometry:Laser Metrology
Type
Instrumentation and Techniques
Information
Symposium - International Astronomical Union , Volume 158: Very High Angular Resolution Imaging , 1994 , pp. 174 - 176
Copyright
Copyright © Kluwer 1994 

References

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