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X-ray reflectivity and diffraction investigation on TiN/SiNx nanolayered coatings deposited by magnetron sputtering

Published online by Cambridge University Press:  01 March 2012

Tao An ,
Hongwei Tian  and
Weitao Zheng
Tao An
Affiliation:
Department of Materials Science, Key Laboratory of Automobile Materials of MOE, and State Key Laboratory of Superhard Materials, Jilin University, Changchun, 130012, China
Hongwei Tian
Affiliation:
Department of Materials Science, Key Laboratory of Automobile Materials of MOE, and State Key Laboratory of Superhard Materials, Jilin University, Changchun, 130012, China
Weitao Zheng
Affiliation:
Department of Materials Science, Key Laboratory of Automobile Materials of MOE, and State Key Laboratory of Superhard Materials, Jilin University, Changchun, 130012, China
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Abstract

Polycrystalline TiN/SiNx multilayer coatings were deposited by reactive magnetron sputtering from Ti and Si targets. Interfaces, structures, and mechanical properties of the multilayers were characterized using X-ray reflectivity (XRR), X-ray diffraction (XRD), and nanoindentation analyses. Results showed that substrate bias voltage had a significant influence on the structures and mechanical properties of the multilayer coatings, in which sharp interfaces are responsible for an enhancement of mechanical properties of the multilayer coatings. The maximum hardness occurs at the −80 V coating with the sharpest interface and the strongest [200] preferred orientation.

Keywords

multilayer coatingsinterfacenanoindentation
Type
Representative Papers from the Chinese XRD 2006 Conference
Information
Powder Diffraction , Volume 22 , Issue 4 , December 2007 , pp. 316 - 318
Copyright
Copyright © Cambridge University Press 2007

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