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X-ray diffraction characterization of MOVPE ZnSe films deposited on (100) GaAs using conventional and high-resolution diffractometers

Published online by Cambridge University Press:  29 February 2012

T. N. Blanton*
Affiliation:
Eastman Kodak Company, Rochester, New York 14650-2106
C. L. Barnes
Affiliation:
Eastman Kodak Company, Rochester, New York 14650-2106
M. Holland
Affiliation:
Eastman Kodak Company, Rochester, New York 14650-2106
K. B. Kahen
Affiliation:
Eastman Kodak Company, Rochester, New York 14650-2106
S. K. Gupta
Affiliation:
Rochester Institute of Technology, Rochester, New York 14623-2106
F. Bai
Affiliation:
Rochester Institute of Technology, Rochester, New York 14623-2106
*
a)Author to whom correspondence should be addressed. Electronic mail: [email protected]

Abstract

ZnSe-based heterostructures grown on GaAs substrates have been investigated for use in pin-diode LED applications. In this study, a conventional Bragg-Brentano diffractometer (BBD) has been used to screen samples for phase identification, crystallite size, presence of polycrystalline ZnSe, and initial rocking curve (RC) analysis. A limitation of the conventional diffractometer is that the smallest RC full width at half maximum (FWHM) that can be achieved is 500 to 600 arc sec. As deposition parameters are optimized and the RC limit of the conventional diffractometer is reached, analysis is moved to a four-bounce high-resolution diffractometer (HRD). Although more time for analysis is required, using the HRD has a RC resolution advantage, where RCs of <20 arc sec are obtained for neat GaAs wafers. Combining the BBD and HRD instruments for analysis of ZnSe films grown on GaAs substrates allows for an efficient means of high sample throughput combined with an accurate measurement of film alignment.

Type
X-Ray Diffraction
Copyright
Copyright © Cambridge University Press 2009

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