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Measurement of thermal expansion coefficient of substrate GGG and its epitaxial layer YIG

Published online by Cambridge University Press:  10 January 2013

Rui-sheng Liang  and
Feng-chao Liu
Rui-sheng Liang
Affiliation:
Physics Department, South China Normal University, Guangzhou, 510631, People's Republic of China
Feng-chao Liu
Affiliation:
Physics Department, South China Normal University, Guangzhou, 510631, People's Republic of China
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Abstract

A new method is used in measuring the linear thermal expansion coefficients in composite consisting of a substrate Gd3Ga2Ga3O12 (GGG) and its epitaxial layer Y3Fe2Fe3O12 (YIG) within the temperature range 13.88 °C–32.50 °C. The results show that the thermal expansion coefficient of GGG in composite is larger than that of the GGG in single crystal; the thermal expansion coefficient of thick film YIG is also larger than that of thin film. The results also show that the thermal expansion coefficient of a composite consisting of film and its substrate can be measured by using a new method.

Keywords

the thermal expansion in a compositeGd3Ga2Ga3O12,Y3Fe2Fe3O12measuring the thermal expansion coefficient
Type
Research Article
Information
Powder Diffraction , Volume 14 , Issue 1 , March 1999 , pp. 2 - 4
Copyright
Copyright © Cambridge University Press 1999

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References

Geller, S., Espinosa, G. P., and Crandall, P. B. (1969). “Thermal expansion of yttrium and gadolinium iron, gallium and aluminum garnets,” J. Appl. Crystallogr. 2, 86–88.CrossRefGoogle Scholar
Liu, Fengchao, and Zheng, Bin (1991). “The linear coefficient of thermal expansion of silicon at room temperature,” Powder Diffr. 6, 147–152.Google Scholar
Liu, Fengchao (1993). “Confirmation of the new technique for measuring the linear thermal expansion of silicon,” Powder Diffr. 8, 36–38.Google Scholar
Nakajima, K., and Machida, K. (1988). “Thermal expansion of gallium garnets and Bi-substituted iron garnet epitaxial thick films,” J. Cryst. Growth 92, 23–25.CrossRefGoogle Scholar
Philips Service P.I.T. Manual Goniometer, PW1050/25 9430 010 50251 CS7323.Google Scholar