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High temperature X-ray diffraction study of phase decomposition in rapidly quenched Al–Ge–Si

Published online by Cambridge University Press:  10 January 2013

N. Mattern ,
A. Teresiak ,
T. Schubert ,
W. Löser  and
S. Doyle
N. Mattern
Affiliation:
Institut für Festkörper und Werkstofforschung Dresden, D-01171 Dresden, Postfach 27 00 16, Germany
A. Teresiak
Affiliation:
Institut für Festkörper und Werkstofforschung Dresden, D-01171 Dresden, Postfach 27 00 16, Germany
T. Schubert
Affiliation:
Institut für Festkörper und Werkstofforschung Dresden, D-01171 Dresden, Postfach 27 00 16, Germany
W. Löser
Affiliation:
Institut für Festkörper und Werkstofforschung Dresden, D-01171 Dresden, Postfach 27 00 16, Germany
S. Doyle
Affiliation:
Institut für Festkörper und Werkstofforschung Dresden, D-01171 Dresden, Postfach 27 00 16, Germany
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Abstract

The phase decomposition occurring during the heating of rapidly quenched Al–Ge–Si alloys has been investigated in situ by means of synchrotron radiation X-ray diffraction. The metastable Al–Ge phases formed in the as-quenched state transform during heating to Al and Ge. The addition of silicon decreases the transformation temperature. A Ge(Si) solid solution is indicated by a systematic change in the lattice constant of Ge as a result of the diffusion of Si from the Al matrix into the phase-separated Ge matrix.

Type
Research Article
Information
Powder Diffraction , Volume 14 , Issue 2 , June 1999 , pp. 118 - 121
Copyright
Copyright © Cambridge University Press 1999

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