Hostname: page-component-586b7cd67f-rdxmf Total loading time: 0 Render date: 2024-11-23T08:40:17.759Z Has data issue: false hasContentIssue false
  • English
  • Français

F23 A Novel TXRF Instrumentation for Contamination Control on 300 mm Silicon Wafers Employing Synchrotron Radiation

Published online by Cambridge University Press:  20 May 2016

B. Beckhoff ,
R. Fliegauf ,
G. Ulm ,
J. Weser ,
T. Ehmann ,
L. Fabry ,
C. Mantler  and
S. Pahlke
B. Beckhoff
Affiliation:
Physikalisch-Technische Bundesanstalt, Berlin, Germany
R. Fliegauf
Affiliation:
Physikalisch-Technische Bundesanstalt, Berlin, Germany
G. Ulm
Affiliation:
Physikalisch-Technische Bundesanstalt, Berlin, Germany
J. Weser
Affiliation:
Physikalisch-Technische Bundesanstalt, Berlin, Germany
T. Ehmann
Affiliation:
Wacker Siltronic AG, Burghausen, Germany
L. Fabry
Affiliation:
Wacker Siltronic AG, Burghausen, Germany
C. Mantler
Affiliation:
Wacker Siltronic AG, Burghausen, Germany
S. Pahlke
Affiliation:
Wacker Siltronic AG, Burghausen, Germany
Get access Rights & Permissions [Opens in a new window]

Abstract

An abstract is not available for this content so a preview has been provided. Please use the Get access link above for information on how to access this content.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Denver X-Ray Conference
Information
Powder Diffraction , Volume 18 , Issue 2 , June 2003 , pp. 177
Copyright
Copyright © Cambridge University Press 2003

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)