Hostname: page-component-cd9895bd7-lnqnp Total loading time: 0 Render date: 2024-12-23T19:10:54.688Z Has data issue: false hasContentIssue false

Curvature determination of embedded silicon chips by in situ rocking curve X-ray diffraction measurements at elevated temperatures

Published online by Cambridge University Press:  28 September 2016

Paul Angerer*
Affiliation:
Materials Center Leoben Forschung GmbH, 8700 Leoben, Austria
Ronald Schöngrundner
Affiliation:
Materials Center Leoben Forschung GmbH, 8700 Leoben, Austria
Katerina Macurova
Affiliation:
Materials Center Leoben Forschung GmbH, 8700 Leoben, Austria
Manfred Wiessner
Affiliation:
Materials Center Leoben Forschung GmbH, 8700 Leoben, Austria
Jozef Keckes
Affiliation:
Department of Materials Physics, Montanuniversität Leoben, Jahnstraße 12, 8700 Leoben, Austria
*
a) Author to whom correspondence should be addressed. Electronic mail: [email protected]

Abstract

The deflection (curvature) of embedded single-crystal silicon chips was investigated by rocking curve X-ray diffraction techniques at two significant manufacturing stages in the process chain of printed circuit boards with embedded components. An overview of the curvature deduction by two different approaches was presented: (1) the measurement of the variation of the rocking curve maximum as a function of the lateral sample position along a specific traverse; the slope in such a diagram is then proportional to the corresponding curvature in that direction. (2) The evaluation of the rocking curve width; here the peak width is inversely proportional to the curvature at known beam diameter, diffraction angle, and beam divergence. It was shown that the rocking curve method is applicable to determine the curvature inside single crystalline chips. Furthermore, the method is also suitable to determine the curvature of fully embedded or encapsulated chips. Additionally the absorption of the radiation in the embed medium was quantitatively discussed. The curvature of two different prepared samples was determined at temperatures up to 200 °C in a heating stage attached to the diffractometer device.

Type
Technical Articles
Copyright
Copyright © International Centre for Diffraction Data 2016 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

DeWolf, I. (2003). “Raman spectroscopy: about chips, and stress,” Spectrosc. Europe 15, 613.Google Scholar
Garrou, P. E., Bower, C., and Ramm, P. (2008). Handbook of 3D Integration: Technology and Applications of 3D Integrated Circuits (Wiley, New York).Google Scholar
Hassell, P. B. (2001). Advanced warpage characterization: location and type of displacement can be equally as important as magnitude. Proc. of Pan Pacific Microelectronics Symp. Conf, Hawaii.Google Scholar
Kaushal, V. and Bongtae, H. (2001). “Far-infrared Fizeau interferometry,” Appl. Opt. 40, 49814987.Google Scholar
Landis, E. N. and Keane, D. T. (2010). “X-ray microtomography,” Mater. Charact. 61, 13051316.Google Scholar
Macurova, K., Kharicha, A., Pletz, M., Mataln, M., Bermejo, R., and Schöngrundner, R. (2013). “Multi-physics simulation of the component attachment within embedding process,” IEEE EuroSimE 16.CrossRefGoogle Scholar
Macurova, K., Angerer, P., Schöngrundner, R., Krivec, T., Morianz, M., and Antretter, T. (2014). “Simulation of stress distribution in assembled silicon dies and deflection of printed circuit boards,” IEEE EuroSimE 17.Google Scholar
Macurova, K., Schöngrundner, R., Bermejo, R., Pletz, M., Antretter, T., Krivec, T., Morianz, M., Brizoux, M., and Lecavelier, A. (2015a). “Comparison of different methods for stress and deflection analysis in embedded die packages during the assembly process,” J. Microelectron. Electron. Packag. 12, 8085.CrossRefGoogle Scholar
Macurova, K., Angerer, P., Bermejo, R., Pletz, M., Schöngrundner, R., Antretter, T., Krivec, T., Morianz, M., Brizoux, M., and Lecavelier, A. (2015b). “Stress and deflection development during die embedding into printed circuit boards,” Mater. Today: Proc. 2, 41964205.Google Scholar
Malacara, D. (2007). Optical Shop Testing (John Wiley & Sons: Hoboken, New Jersey), 3rd ed., p. 46.Google Scholar
Martinschitz, K. J., Eiper, E., Massl, S., Koestenbauer, H., Daniel, R., Fontalvo, G., Mitterer, C., and Keckes, J. (2006). “Rapid determination of stress factors and absolute residual stresses in thin films,” J. Appl. Crystallogr. 39, 777783.CrossRefGoogle Scholar
Moore, E. G. (1965). “Cramming more components onto integrated circuits,” Electronics 38, 47.Google Scholar
Mutti, P. and Briggs, G. A. D. (1994). “Scanning acoustic microscopy,” in Microanalysis of Solids, edited by Yacobi, B. G., Holt, D. B. and Kazmerski, L. L., Plenum Press, New York, pp. 327355.Google Scholar
Noyan, I. C. and Cohen, J. B. (1987). Residual Stress – Measurement by Diffraction and Interpretation (Springer, New York).Google Scholar
Ortner, B. (2005). “Lattice-constant and stress measurement in single crystals: a new method, “J. Appl. Crystallogr. 38, 678684.Google Scholar
Popovici, M., Stoica, A. D., Chalupa, B., and Mikula, P. (1988). “Interpretation of bent-crystal rocking curves,” J. Appl. Crystallogr. 21, 258265.Google Scholar
Resel, R., Tamas, E., Sonderegger, B., Hofbauer, P., and Keckes, J. (2003). “A heating stage up to 1173 K for X-ray diffraction studies in the whole orientation space,” J. Appl. Crystallogr. 36, 8085.CrossRefGoogle Scholar
Ryu, S.-K., Zhao, Q., Hecker, M., Son, H.-Y., and Byun, K.-Y. (2012). “Micro-Raman spectroscopy and analysis of near-surface stresses in silicon around through-silicon vias for three-dimensional interconnects,” J. Appl. Phys. 111, 18.CrossRefGoogle Scholar
Segmüller, A., Angilelo, J., and La Placa, S. J. (1980). “Automatic x-ray diffraction measurement of the lattice curvature of substrate wafers for the determination of linear strain patterns,” J. Appl. Phys. 51, 62246230.Google Scholar
Wang, L.-J., Zhang, S.-M., Wang, Y.-T., Jiang, D.-S., Zhu, J.-J., Zhao, D.-G., Liu, Z.-S., Wang, H., Shi, Y.-S., Wang, H., Liu, S.-Y., and Yang, H. (2009). “Curvature correction of FWHM in the x-ray rocking curve of bent heteroepitaxial films,” Chin. Phys. Lett. 26, 13.Google Scholar
Welzel, U., Ligot, J., Lamparter, P., Vermeulen, A. C., and Mittemeijer, E. J. (2005). “Stress analysis of polycrystalline thin films and surface regions by X-ray diffraction,” J. Appl. Crystallogr. 38, 129.Google Scholar
Wong, C. S., Bennett, N. S., Manessis, D., Danilewsky, A., and McNally, P. J. (2014). “Non-destructive laboratory-based X-ray diffraction mapping of warpage in Si die embedded in IC packages,” Microelectron. Eng. 117, 4856.Google Scholar
Yang, S. Y., Kwon, W. S., and Lee, S. B. (2012). “Chip warpage model for reliability prediction of delamination failures,” Microelectron. Reliab. 52, 718724.Google Scholar
Zhang, G. Q., Van Driel, W. D., and Fan, X. J. (2006). Solid Mechanics and its Applications (Springer, Dordrecht).Google Scholar
Zhao, H.-Q., Yu, L.-J., Huang, Y.-Z., and Wang, Y.-T. (2006). “Strain analysis of InP/InGaAsP wafer bonded on Si by X-ray double crystalline diffraction,” Mater. Sci. Eng. B 133, 117123.CrossRefGoogle Scholar