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Laser ablation of the cell wall and localized patch clamping of the plasma membrane in the filamentous fungus Aspergillus: characterization of an anion-selective efflux channel

Published online by Cambridge University Press:  01 December 1997

STEPHEN K. ROBERTS ,
GRAHAM K. DIXON ,
STUART J. DUNBAR  and
DALE SANDERS
STEPHEN K. ROBERTS
Affiliation:
The Plant Laboratory, Department of Biology, University of York, York YO1 5YW, UK
GRAHAM K. DIXON
Affiliation:
Zeneca Pharmaceuticals, Mereside, Alderey Park, Macclesfield, Cheshire SK10 4TG, UK
STUART J. DUNBAR
Affiliation:
Zeneca Agrochemicals, Jeallot's Hill Research Station, Bracknell, Berkshire RG42 6ET, UK
DALE SANDERS
Affiliation:
The Plant Laboratory, Department of Biology, University of York, York YO1 5YW, UK
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Abstract

We have used a pulsed u.v. laser to ablate the cell wall of the filamentous fungus Aspergillus niger van Tiegh., and expose the plasma membrane at defined points along the hypha. Using the patch clamp technique, giga ohm seals (up to 20 GΩ) and recordings of plasma membrane ion channels were obtained. We describe, for the first time in fungi, a 43 pS plasma membrane anion efflux channel. Its potential role in cell signalling and pH homeostasis is discussed.

Keywords

Laser ablationanion channelAspergillus
Type
Research Article
Information
The New Phytologist , Volume 137 , Issue 4 , December 1997 , pp. 579 - 585
Copyright
© Trustees of the New Phytologist 1997

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