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ZnS, CdS and ZnxCd1-xS Thin Films from Zn(II) and Cd(II) Complexes of 1, 1, 5, 5-Tetramethyl-2-4-dithiobiuret As Single Molecular Precursors

Published online by Cambridge University Press:  01 February 2011

Karthik Ramasamy ,
Mohammad A. Malik ,
Paul O'Brien  and
James Raftery
Karthik Ramasamy
Affiliation:
[email protected], University of Manchester, School of Chemistry, Manchester, United Kingdom
Mohammad A. Malik
Affiliation:
[email protected], University of manchester, School of chemistry, Manchester, Lancashire, United Kingdom
Paul O'Brien
Affiliation:
[email protected], University of Manchester, School of Chemistry, Material Science Centre, Manchester, Lancashire, United Kingdom
James Raftery
Affiliation:
[email protected], University of manchester, School of chemistry, Manchester, Lancashire, United Kingdom
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Abstract

Synthesis of zinc and cadmium complexes of 1, 1, 5, 5-tetramethyl-2-4-dithiobiuret (M{N(SCNMe2)2}2) (M = Zn, Cd) is described together with X-ray single crystal of cadmium complex. These complexes have been used as a single molecular precursor for the deposition of ZnS, CdS and ZnxCd1-xS thin films by aerosol assisted chemical vapour deposition (AACVD) method. Adherent specular films of ZnS and CdS were obtained in the temperature range 300 – 500 °C. Hexagonal ZnxCd1-xS films were obtained at 400 °C by varying the precursor concentration. XRD of ZnS films showed cubic to hexagonal phase conversion above 350 °C. SEM showed that the morphology of the films varied depending on the deposition temperature. Films were also characterized by atomic force microscopy (AFM). To the best of our knowledge these complexes are the first in its class to be used as a single molecular precursor to deposit ZnS, CdS, and ZnxCd1-xS thin films.

Keywords

chemical synthesischemical vapor deposition (CVD) (deposition)thin film
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1145: Symposium MM – Application of Group IV Semiconductor Nanostructures , 2008 , 1145-MM04-40
Copyright
Copyright © Materials Research Society 2009

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