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ZnO Thin Film Deposition on Sapphire Substrates by Chemical Vapor Deposition

Published online by Cambridge University Press:  31 January 2011

Zhuo Chen ,
Tom Salagaj ,
Christopher Jensen ,
Karlheinz Strobl ,
Mim Nakarmi  and
Kai Shum
Zhuo Chen
Affiliation:
[email protected], brooklyn college, brooklyn, New York, United States
Tom Salagaj
Affiliation:
[email protected], CVD Equipment, Ronkonkoma, New York, United States
Christopher Jensen
Affiliation:
[email protected], CVD Equipment, Ronkonkoma, New York, United States
Karlheinz Strobl
Affiliation:
[email protected], CVD Equipment, Ronkonkoma, New York, United States
Mim Nakarmi
Affiliation:
Physics Department, Brooklyn College of the City University of New York, 2900 Bedford Avenue, Brooklyn, NY 11210, USA
Kai Shum
Affiliation:
[email protected], Brooklyn College, Physics, 2900 Bedford Ave, Brooklyn, New York, 11210, United States
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Abstract

ZnO thin films with thickness around 200 nm were deposited on a-plane sapphire substrates by Chemical Vapor Deposition (CVD) method with a mixed ZnO-powder/C-powder solid source. These films were characterized by Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM), and photoluminescence (PL) spectroscopy. The correlation between surface structural properties of ZnO thin films and their optical signature measured by temperature dependence of PL is investigated for various growth conditions such as flow rate O2 injection gas and growth temperature. At room temperature, the columbic interaction enhanced absorption edge of 3.305 eV of these films was determined by optical absorption measurements.

Keywords

chemical vapor deposition (CVD) (deposition)crystallineepitaxy
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1167: Symposium O – Compound Semiconductors for Energy Applications and Environmental Sustainability , 2009 , 1167-O07-09
Copyright
Copyright © Materials Research Society 2009

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