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X-Ray Observation of Stress Gradients and Precipitation in Passivated AL-0.5% Cu Films

Published online by Cambridge University Press:  15 February 2011

Paul R. Besser ,
Sean Brennan  and
John C. Bravman
Paul R. Besser
Affiliation:
Materials Science and Engineering Department, Stanford University, Stanford, CA
Sean Brennan
Affiliation:
Stanford Synchrotron Radiatio n Laboratory, Menlo Park, CA
John C. Bravman
Affiliation:
Materials Science and Engineering Department, Stanford University, Stanford, CA
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Abstract

Grazing incidence x-ray scattering has been used with a synchrotron source to characterize the stress gradients during thermal cycling in 1.0 μm thick Al-0.5%Cu films passivated with silicon nitride. The films were cycled between room temperature and 400°C. The stress-temperature behavior is quantitatively similar to that measured for unpassivated films. The presence of an inhomogeneous strain is documented at low temperatures. The dissolution and precipitation of Al2Cu is suggested as an explanation for the gradients and asymmetric x-ray peak broadening.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 307: Symposium L – Applications of Synchrotron Radiation Techniques to Materials Science , 1993 , 161
Copyright
Copyright © Materials Research Society 1993

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References

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