Hostname: page-component-cd9895bd7-hc48f Total loading time: 0 Render date: 2024-12-29T17:04:24.476Z Has data issue: false hasContentIssue false

X-ray Microprobe Studies of Materials Problems Related to Microelectromechanical Systems (MEMS) Structures

Published online by Cambridge University Press:  10 February 2011

N. Mölders
Affiliation:
Center for Advanced Microstructures and Devices, Louisiana State University, Baton Rouge, LA 70806, [email protected]
P.J. Schilling
Affiliation:
Department of Mechanical Engineering, University of New Orleans (UNO), New Orleans, LA 70148, USA
J. Göttert
Affiliation:
Group ANKA, Forschungszentrum Karlsruhe, Germany
H.O. Moser
Affiliation:
Group ANKA, Forschungszentrum Karlsruhe, Germany
V. Saile
Affiliation:
Institut of Microstructure Technology, Forschungszentrum Karlsruhe, Germany
Get access

Abstract

The understanding of the physical, chemical and mechanical properties of materials used in micro-electromechanical systems (MEMS) is essential for the successful application. For the characterization of such materials, it is often necessary to utilize a probe which can gather information on the same scale as the devices themselves. Based on these needs, x-ray microprobe analysis has been employed to perform spatially resolved measurements on several problems related to the fabrication of MEMS devices. These include spatially resolved transmission measurements of the homogeneity of transmitted flux through a graphite mask, micro-fluorescence measurements to assess elemental distributions, and micro-XANES measurements to follow the breakdown of new sulfone-based x-ray resists. These studies demonstrate the value of such an instrument in the characterization of micro-systems.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Mölders, N., Schilling, P. J., He, J.H., Saile, V., Moser, H. O. et al. , in Applications of Synchrotron Radiation Techniques to Materials Science II, “X-ray absorption analysis of electroplated permalloys used in microfabrication,”, (Mater. Res. Soc. Proc. 437, Warrendale, 1996)Google Scholar
2. Mölders, N., Moser, H. O., Saile, V. and Schilling, P. J., Scientific Report FZKA 6314, 1999.Google Scholar
3. Kirkpatrick, P., Baez, A. and Newell, A., Physical Review 73, 535536 (1948).Google Scholar
4. Coane, P., Giasolli, R., Ledger, S., Lian, K., Ling, Z. and Göttert, J., “Fabrication of HARM Structures by Deep X-Ray Lithography Using graphite Mask Technology”, submitted at HARMST 99.Google Scholar
5. Davies, J., “Synthesis of UV/X-Ray Sensitive Polymers and Their applications as Resists,” Ph.D., Louisiana State University, 1996.Google Scholar