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X-ray Diffraction Investigations of TiO2 Thin Films and Their Thermal Stability

Published online by Cambridge University Press:  19 July 2011

Radomír Kužel
Affiliation:
Department of Condensed Matter Physics, Faculty of Mathematics and Physics, Charles University in Prague, Ke Karlovu 5, 121 16 Prague 2, Czech Republic
Lea Nichtová
Affiliation:
Department of Condensed Matter Physics, Faculty of Mathematics and Physics, Charles University in Prague, Ke Karlovu 5, 121 16 Prague 2, Czech Republic
Zdeněk Matěj
Affiliation:
Department of Condensed Matter Physics, Faculty of Mathematics and Physics, Charles University in Prague, Ke Karlovu 5, 121 16 Prague 2, Czech Republic
Zdeněk Hubička
Affiliation:
Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague, Czech Republic
Josef Buršík
Affiliation:
Institute of Inorganic Chemistry of the AS CR, v. v. i., 250 68 Rez 1001, Czech Republic
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Abstract

In-situ laboratory measurements in X-ray diffraction (XRD) high-temperature chamber and detailed XRD measurements at room temperature were used for the study of the thickness, temperature and time dependences of crystallization of amorphous TiO2 thin films. The films deposited by magnetron sputtering, plasma jet sputtering and sol-gel method were analyzed. Tensile stresses were detected in the first two cases. They are generated during the crystallization and inhibit further crystallization that also depends on the film thickness. XRD indicated quite rapid growth of larger crystallites unlike the sol-gel films when the crystallites grow mainly by increasing of annealing temperature.

Type
Research Article
Copyright
Copyright © Materials Research Society 2011

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References

REFERENCES

1. Fujishima, A. and Zhang, X., C.R. Chim. 9, 50760 (2006).Google Scholar
2. Hashimoto, K., Irie, H. and Fujishima, A., 2005, Jpn. J. Appl. Phys., 44, 82698285 (2005)Google Scholar
3. Mills, A., Hill, G., Bhopal, S., Parkin, P. and O’Neill, S. A., J. Photochem. Photobiol., A160, 185194 (2003).Google Scholar
4. Zeman, P. and Takabayashi, S., J. Vac. Sci. Technol., A20, 388393 (2002).Google Scholar
5. Ni, M., Leung, M., Leung, D.Y.C. and Sumathy, K., Renewable Sustainable Energy Rev., 11, 401425 (2007).Google Scholar
6. Kirsch, Bradley L, Richman, Erik K, Riley, Andrew E, Tolbert, Sarah H, Journal of Physical Chemistry B, 108, 34, 12698-12706 (2004).Google Scholar
7. Yina, Shu, Inouea, Yuichi, Uchidaa, Satoshi, Fujishiroa, Yoshinobu and Satoa, Tsugio, Journal of Materials Research, 13, 844847 (1998).Google Scholar
8. Yanagisawa, Kazumichi and Ovenstone, James, J. Phys. Chem. B, 103(37), 77817787 (1999).Google Scholar
9. Matěj, Z., Kužel, R. and Nichtová, L., Powder Diffraction, 25, 125131 (2010).Google Scholar
10. Kužel, R., Nichtová, L., Matěj, Z., Heřman, D., Šícha, J. and Musil, J., Z. Kristallogr. Suppl. 26, 247252 (2007).Google Scholar
11. Kužel, R., Nichtová, L., Matěj, Z. and Musil, J., Thin Solid Films, 519(5),16491654 (2010).Google Scholar
12. Matěj, Z., Kužel, R. and Nichtová, L., Metallurgical and Materials Transactions A, (2011) in press, DOI: 10.1007/s11661-010-0468-z.Google Scholar
13. Kužel, R., Nichtová, L., Matěj, Z., Šícha, J. and Musil, J., Z. Kristallogr., 27, 287294 (2008).Google Scholar
14. Baroch, P., Musil, J., Vlcek, J., Nam, K. H. and Han, J. G., Surf. Coat. Technol., 193, 107 (2005).Google Scholar
15. Avrami, M. J., J. Chem. Phys. 8, 212 (1941).Google Scholar
16. Kolomogorov, A. N., Izv. Akad. Nauk SSSR, Ser. Mat. 3, 355 (1937).Google Scholar