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X-ray Diffraction Investigations of TiO2 Thin Films and Their Thermal Stability

Published online by Cambridge University Press:  19 July 2011

Radomír Kužel ,
Lea Nichtová ,
Zdeněk Matěj ,
Zdeněk Hubička  and
Josef Buršík
Radomír Kužel
Affiliation:
Department of Condensed Matter Physics, Faculty of Mathematics and Physics, Charles University in Prague, Ke Karlovu 5, 121 16 Prague 2, Czech Republic
Lea Nichtová
Affiliation:
Department of Condensed Matter Physics, Faculty of Mathematics and Physics, Charles University in Prague, Ke Karlovu 5, 121 16 Prague 2, Czech Republic
Zdeněk Matěj
Affiliation:
Department of Condensed Matter Physics, Faculty of Mathematics and Physics, Charles University in Prague, Ke Karlovu 5, 121 16 Prague 2, Czech Republic
Zdeněk Hubička
Affiliation:
Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague, Czech Republic
Josef Buršík
Affiliation:
Institute of Inorganic Chemistry of the AS CR, v. v. i., 250 68 Rez 1001, Czech Republic
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Abstract

In-situ laboratory measurements in X-ray diffraction (XRD) high-temperature chamber and detailed XRD measurements at room temperature were used for the study of the thickness, temperature and time dependences of crystallization of amorphous TiO2 thin films. The films deposited by magnetron sputtering, plasma jet sputtering and sol-gel method were analyzed. Tensile stresses were detected in the first two cases. They are generated during the crystallization and inhibit further crystallization that also depends on the film thickness. XRD indicated quite rapid growth of larger crystallites unlike the sol-gel films when the crystallites grow mainly by increasing of annealing temperature.

Keywords

thin filmx-ray diffraction (XRD)crystalline
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1352: Symposium GG – Titanium Dioxide Nanomaterials , 2011 , mrss11-1352-gg10-31
Copyright
Copyright © Materials Research Society 2011

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References

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