Hostname: page-component-cd9895bd7-7cvxr Total loading time: 0 Render date: 2024-12-27T02:41:47.486Z Has data issue: false hasContentIssue false

WO3-x Nanorod Arrays Based Sensors with High Sensitivity and Quick Response for Detecting Pollutants

Published online by Cambridge University Press:  01 February 2011

Xinpeng Wang
Affiliation:
[email protected], University of Puerto Rico, Department of Physics, San Juan, 00931, Puerto Rico
Jie Lou
Affiliation:
[email protected], University of Science and Technology of China, Department of modern Physics, Hefei, 230026, China, People's Republic of
Zhenbo Wang
Affiliation:
[email protected], Harbin Institute of Technology, Department of Applied Chemistry, Harbin, 150001, China, People's Republic of
Peter Xianping Feng
Affiliation:
[email protected], University of Puerto Rico, Department of Physics, PO Box 23343, Department of Physics,, University of Puerto Rico, Rio Piedras Campus, San Juan, 00931, Puerto Rico
Get access

Abstract

Tungsten oxide nanorod arrays deposited on the cylindrical substrate have been used for fabrication of a two-dimensional (2D) sensor. The sensibility and capacity towards methane and acetone at different temperatures have been examined. Experimental data have indicated that the newly designed sensor is highly sensitive to methane with low cross sensitivity towards possible mixed organic gas acetone, relying on the operating temperature. At room temperature (20°C), a quick response time and recovery time of the sensor, less than 10 ms, have been obtained.

Type
Research Article
Copyright
Copyright © Materials Research Society 2008

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Kim, Y. S., Ha, S.-C., Kim, K., Yang, H., Park, J. T., Lee, C. H., Choi, J., Paek, J. and Lee, K., Appl. Phys. Lett. 86, 213105 (2005).Google Scholar
2. Yun, M. H., Myung, N. V., Vasquez, R. P., Lee, C. S., Menke, E. and Penner, R. M., Nano Lett. 4, 419 (2004).Google Scholar
3. Solis, J. L., Saukko, S., Kish, L., Granqvist, C. G. and Lantto, V., Thin Solid Films 391, 255 (2001).Google Scholar
4. Comini, E., Anal. Chim. Acta 568, 28 (2006).Google Scholar
5. Ionescu, R., Hoel, A., Granquist, C. G., Llobet, E. and Heszler, P., Sensor Actuat. B 104, 124 (2005).Google Scholar
6. Kong, J., Franklin, N. R., Zhou, C., Chapline, M. G., Peng, S., Cho, K., and Dai, H., Science 287, 622 (2000).Google Scholar
7. Williams, D. E., Aliwell, S. R., Pratt, K. F. E., Caruana, D. J., Jones, R. L., Cox, R. A., Hansford, G. M. and Halsall, J., Meas. Sci. Technol. 13, 923 (2002).Google Scholar
8. Li, C. C., Du, Z. F., Li, L. M., Yu, H. C., Wan, Q., and Wang, T. H., Appl. Phys. Lett. 91, 032101 (2007).Google Scholar
9. Ponzoni, A., Comini, E., Sberveglieri, G., Zhou, J., Deng, S. Z., Xu, N. S., Ding, Y. and Wang, Z. L., Appl. Phys. Lett. 88, 20 (2006).Google Scholar
10. Fan, Z. Y. and Lu, J. G., Appl. Phys. Lett. 86, 12 (2005).Google Scholar
11. Kolmakov, A., Klenov, D. O., Lilach, Y., Stemmer, S. and Moskovits, M., Nano Lett. 5, 667 (2005).Google Scholar
12. Sysoev, V. V., Button, B. K., Wepsiec, K., Dmitriev, S. and Kolmakov, A., Nano Lett. 6, 1584 (2006).Google Scholar
13. Deb, B., Desai, S., Sumanasekera, G. U. and Sunkara, M. K., Nanotechnology 18, 285501 (2007).Google Scholar
14. Law, M., Kind, H., Messer, B., Kim, F., and Yang, P., Angew. Chem. Int. Ed. 41, 2405 (2002).Google Scholar
15. Kolmakov, A., Zhang, Y., Cheng, G., and Moskovits, M., Adv. Mater. 15, 997 (2003).Google Scholar
16. Li, C., Zhang, D., Liu, X., Han, S., Tang, T., Han, J., and Zhou, C., Appl. Phys. Lett. 82, 1613 (2003).Google Scholar
17. Feng, P. X. and James, B. W., Plasma Sources Sci. Technol. 13, 68 (2004).Google Scholar
18. Wang, X. P., Yang, B. Q., Zhang, H. X. and Feng, P. X., Nanoscale Res. Lett. 2, 405 (2007).Google Scholar
19. Feng, P. X., Wang, X. P., Zhang, H. X., Yang, B. Q., Wang, Z. B., González-Berréos, A., Morell, G., and Weiner, B., J. Phys. D: Appl. Phys. 40, 5239 (2007).Google Scholar
20. Jiménez, I., Centeno, M. A., Scotti, R., Morazzoni, F., Cornet, A., and Morante, J. R., J. Electrochem. Soc. 150, H72 (2003).Google Scholar
21. Xue, X. Y., Chen, Y. J., Wang, Y. G., and Wang, T. H., Appl. Phys. Lett. 86, 233101 (2005).Google Scholar
22. Taurino, A. M., Forleo, A., Francioso, L., and Siciliano, P., Appl. Phys. Lett. 88, 152111 (2006).Google Scholar