Hostname: page-component-586b7cd67f-g8jcs Total loading time: 0 Render date: 2024-11-25T17:36:30.731Z Has data issue: false hasContentIssue false
  • English
  • Français

Wear of Ion Implanted Glassy Carbon

Published online by Cambridge University Press:  25 February 2011

John T. A. Pollock ,
Matthew Farrelly  and
Leszek S. Wielunski
John T. A. Pollock
Affiliation:
CSIRO Division of Materials Science and Technology, Lucas Heights Research Laboratories, Menai, NSW 2234, Australia.
Matthew Farrelly
Affiliation:
CSIRO Division of Materials Science and Technology, Lucas Heights Research Laboratories, Menai, NSW 2234, Australia.
Leszek S. Wielunski
Affiliation:
CSIRO Division of Materials Science and Technology, Lucas Heights Research Laboratories, Menai, NSW 2234, Australia.
Get access

Abstract

Significantly improved wear properties are described for glassy carbon following implantation with 2 MeV helium and 50 keV nitrogen to doses in the range 1015–1017 ions cm−2. Implanted material is up to 100 times more wear resistant to diamond abrasion than unimplanted material. Enhanced wear resistance is available at the surface with nitrogen but lies below the surface with helium, reflecting the difference in modified depth associated with implant energy and ion mass. Unusually for ion implantation, dose related surface compaction is observed for both nitrogen and helium. Changes in microstructure during implantation with particular regard to collision processes and amorphisation of the graphitic fraction of glassy carbon are discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 93: Symposium C – Materials Modification and Growth Using Ion Beams , 1987 , 317
Copyright
Copyright © Materials Research Society 1987

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Cowlard, F.C. and Lewis, J.C., J. Mat. Sci. 2 507 (1967).Google Scholar
[2] Phillips, V.A., Metallography 6 361 (1973).Google Scholar
[3] Bose, S. and Bragg, R.H., Carbon 19 289 (1981).Google Scholar
[4] Benson, J., J. Biomed. Mater. Res. Symp., No. 2, Part 1, 41 (1971).Google Scholar
[5] Shim, H.S. and Shoen, F.J., Biomater. Med. Dev. Artif. Organs, 2 103 (1974).Google Scholar
[6] Pollock, J.T.A., Clissold, R.A. and Farrelly, M., J. Mat. Sci. Letts. (1987), to be published.Google Scholar
[7] Farrelly, M. and Pollock, J.T.A.. Materials Forum (1987), to be published.Google Scholar
[8] Pollock, J.T.A., Kenny, M.J. and Clissold, R.A., unpublished.Google Scholar
[9] Beanland, D.G., in Ion Implantation and Beam Processing, edited by Williams, J.S. and Poate, J.M. (Academic Press, New York, 1984) p. 2 65.Google Scholar
[10] Hawthorne, H.M., Carbon, 13 215 (1957).Google Scholar
[11] Hartley, N.E.W., in Treatise on Materials Science and Technology, vol. 18 (Academic Press, New York, 1980), p. 3 21.Google Scholar
[12] Venkatesan, T., Elman, B.S., Braustein, G., Dresselhaus, M.S. and Dresselhaus, G., J. Appl. Phys., 56 3232 (1984).Google Scholar
[13] Elman, B.S., Dresselhaus, M.S., Dresselhaus, G., Maby, E.W. and Mazurek, H., Phys. Rev. B. 24 1027 (1981).Google Scholar
[14] Nathan, M.I., Smith, J.E. and Tu, K.N..J. Appl. Phys., 45 2370 (1974).Google Scholar
[15] Takahashi, K. and Iwaki, M., Nucl. Instr. Meth., B7/8 526 (1985).Google Scholar
[16] Prawer, S. and Rossow, C.J., To be Published.Google Scholar
[17] The Stopping and Ranges of Ions in Matter, vols I and IV, edited by Ziegler, J.F. (Pergamon Press, New York).Google Scholar
[18] Wielunski, L.S., Farrelly, M. and Pollock, J.T.A. (To be published).Google Scholar
[19] McHarque, C.J., White, C.W., Appleton, B.R., Farlow, G.C. and Williams, J.M., 1984, in Ion Beam Processing of Materials (eds.Hubler, , Holland, , Clayton, and White, ) Nth. Holland, New York, p. 385.Google Scholar
[20] Arnold, G.W., Radiat. Eff., 65 257 (1982).Google Scholar