Hostname: page-component-cd9895bd7-7cvxr Total loading time: 0 Render date: 2024-12-27T02:03:34.468Z Has data issue: false hasContentIssue false

Visible Light Emission from Porous Silicon Examined by Photoluminescence and Raman Spectroscopy

Published online by Cambridge University Press:  28 February 2011

Terry R. Guilinger
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185
Michael J. Kelly
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185
David R. Tallant
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185
David A. Redman
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185
David M. Follstaedt
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185
Get access

Abstract

We describe the acquisition of Raman and photoluminescence (PL) spectra on porous silicon (PS) samples that emit visible light. Spectra were acquired in both ex situ experiments (after exposure to air) and in situ experiments (with the PS covered either with the hydrofluoric acid electrolyte used in the formation process or water). Our results generally show a correlation of blue-shifted PL with increased oxidation. In one set of ex situ experiments, however, we observed an inconsistency in the shift of the wavelengthof maximum luminescence intensity for PS samples that exhibit oxygenated character in the Raman spectra. A higher anodization current density produced a red shift in the PL spectra in one experiment, while chemical dissolution of the PS by hydrofluoric acid produced the well-known blue shift in the other case. In two in situ experiments, we observed very weak and red-shifted PL for a PS sample immersed in HF (compared to the same sample measured later in air) while in another we immersed air-exposed PS in water and observed a 15-fold increase in PL intensity along with a blue shift in the luminescence maximum.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Gee, A., J. Electrochem. Soc., 107, 787 (1960).Google Scholar
2. Canham, L. T., Appl. Phys. Lett., 57, 1046 (1990).Google Scholar
3. Cullis, A. G. and Canham, L. T., Nature, 353, 335 (1991).Google Scholar
4. Brandt, M. S., Fuchs, H. D., Stutzmann, M., Weber, J., and Cardona, M., Sol. St. Comm., 81, 307 (1992).Google Scholar
5. Tsai, C., Li, K.-H., Kinosky, D. S., Qian, R.-Z., Hsu, T.-C., Irby, J. T., Banerjee, S. K., Tasch, A. F., Campbell, J. C., Hance, B. K., and White, J. M., Appl. Phys. Lett., 60, 1700 (1992).Google Scholar
6. Vasquez, R. P., Fathauer, R. W., George, T., Ksendzov, A., and Lin, T. L., Appl. Phys. Lett., 60, 1004 (1992).Google Scholar
7. Xie, Y. H., Wilson, W. L., Ross, F. M., Mucha, J. A., Fitzgerald, E. A., Macaulay, J. M., and Harris, T. D., J. Appl. Phys., 71, 2403 (1992).Google Scholar
8. Robinson, M. B., Dillon, A. C., Haynes, D. R., and George, S. M., Appl. Phys. Lett., 61, 1414 (1992).Google Scholar
9. Sui, Z., Leong, P. P., Herman, I. P., Higashi, G. S., and Temkin, H., Appl. Phys. Lett., 60, 2086 (1992).Google Scholar
10. Tsang, J. C., Tischler, M. A., and Collins, R. T., Appl. Phys. Lett., 60, 2279 (1992).Google Scholar
11. Tsu, R., Shen, H., and Dutta, M., Appl. Phys. Lett., 60, 112 (1992).Google Scholar
12. Pollak, F. H., Test and Measurement World, 5, 2 (1985).Google Scholar
13. Hooft, G. W.'t, Kessener, Y. A. R. R., Rikken, G. L. J. A., and Venhuizen, A. H. J., Appl. Phys. Lett. 61, 2344 (1992).Google Scholar
14. Brodsky, M. H., Cardona, M., and Cuomo, J. J., Phys. Rev. B., 16, 3556 (1977).Google Scholar
15. Chabal, Y. J., Higashi, G. S., Raghavachari, K., and Burrows, V. A., J. Vac. Sci. Technol. A, 7, 2104 (1989).Google Scholar
16. Lucovsky, G., Nemanich, R. J., and Knights, J. C., Phys. Rev. B., 19, 2064 (1979).Google Scholar
17. Wagner, C. in Advances in Electrochemistry and Electrochemical Engineering, edited by Tobias, C. and Delahay, P., (Elsevier Science Publishers, New York, 1962), 2, pp. 114.Google Scholar
18. Tischler, M. A., Collins, R. T., Stathis, J. H., and Tsang, J. C., Appl. Phys. Lett., 60, 639 (1992).Google Scholar