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Uv Laser-Initiated Deposition of Al2O3 Films: The Effect of Surface Irradiation

Published online by Cambridge University Press:  21 February 2011

T. F. Deutsch ,
D. J. Silversmith  and
R. W. Mountain
T. F. Deutsch
Affiliation:
Lincoln Laboratory, Massachusetts Institute of TechnologyLexington, Massachusetts 02173–0073
D. J. Silversmith
Affiliation:
Lincoln Laboratory, Massachusetts Institute of TechnologyLexington, Massachusetts 02173–0073
R. W. Mountain
Affiliation:
Lincoln Laboratory, Massachusetts Institute of TechnologyLexington, Massachusetts 02173–0073
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Abstract

The effects of 193 and 248 nm UV surface irradiation on the properties of Al2O3 films produced by UV laser-initiated deposition have been investigated using ellipsometry and electrical measurements. The UV irradiated region shows a higher refractive index than the unirradiated regions, indicating that densification has occurred. Energy fluences as low as 1 mJ/cm2, too low to cause significant transient heating, produce measurable effects. The results suggest that UV irradiation may be used to obtain lower deposition temperatures in a variety of deposition systems.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 29: Symposium I – Laser-Controlled Chemical Processing of Surfaces , 1983 , 67
Copyright
Copyright © Materials Research Society 1984

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References

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