Hostname: page-component-cd9895bd7-q99xh Total loading time: 0 Render date: 2024-12-27T02:42:34.619Z Has data issue: false hasContentIssue false

Uv Excimer Laser-Induced Deposition of Palladium from Palladium Acetate Films

Published online by Cambridge University Press:  21 February 2011

Hilmar Esrom
Affiliation:
Asea Brown Boveri, Corporate Research, D-6900 Heidelberg, FRG
Georg Wahl
Affiliation:
Asea Brown Boveri, Corporate Research, D-6900 Heidelberg, FRG
Get access

Abstract

UV excimer laser-induced deposition of palladium from spin coated palladium acetate films in air is described. We have investigated mainly the deposition of palladium on aluminum oxide and quartz substrates and its dependence on the fluence and the number of excimer laser pulses. The decomposition mechanism was studied by measuring in situ the transmitted pulse energy during the exposure process. We have found that the excimer laser-induced decomposition of palladium acetate films is mainly pyrolytic and a simple model can be used to describe the decomposition process.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Sausa, R.C., Gupta, A., and White, J.R., J.Electrochem.Soc., Vol. 134, No.11,2707(1987)Google Scholar
2. Cole, H.S., Liu, Y.S., Rose, J.W., Guida, R., Levinson, L.M., and Philipp, H.R., in Laser Processes for Microelectronic Applications, Vol.88-10 of the Proceedings of the Electrochemical Society, edited by Ritsko, J.J., Ehrlich, D.J., and Kashiwagi, M. Pennington, NJ, 1988); also article in this journalGoogle Scholar
3. Fisanick, G.J., Gross, M.E., Hopkins, J.B., Fennell, M.D., Schnoes, K.J., and Katzir, A., J.Appl.Phys. 57(4),1139(1985)Google Scholar
4. Fisanick, G.J., Hopkins, J.B., Gross, M.E., Fennell, M.D., and Schnoes, K.J., Appl.Phys.Lett. 46(12),1184(1985)Google Scholar
5. Gross, M.E., Fisanick, G.J., Gallagher, P.K., Schnoes, K.J., and Fennell, M.D., Appl.Phys.Lett. 47(9),923(1985)Google Scholar
6. Auerbach, A., Appl.Phys.Lett. 47(7),669(1985)Google Scholar
7. Gross, M.E., Appelbaum, A., and Schnoes, K.J., J.Appl.Phys. 60(2), 529(1986)Google Scholar
8. Gross, M.E., Appelbaum, A., and Gallagher, P.K., J.Appl.Phys. 61(4), 1628(1987)Google Scholar
9. Gupta, A. and Jagannathan, R., Appl.Phys.Lett. 51(26),2254(1987)Google Scholar
10. Esrom, H., ahl, G.W, and Stuke, M., Mat. Res.Soc.Symp.Proc., Vol.131,581 (1989)Google Scholar
11. Esrom, H. and Kogelschatz, U., in these proceedingsGoogle Scholar
12. Gallagher, P.K. and Gross, M.E., J.Thermal Anal. 31 231,(1986)Google Scholar
13. Koglin, W., Kurzes Handbuch Der Chemie, Göttingen, FRG, Vandenhoeck & Ruprecht,1954 Google Scholar