Electrochemical Impedance Spectroscopy (EIS) and the Parallel Electrical Dielectric Response Analysis (PEDRA) application were used to describe the inner barrier oxide films on irradiated zirconium alloys. This is achieved with minimal surface preparation and without disturbing the outer porous oxide. These two distinguishable inner and outer oxide layers result from a growth-fracture oxidation mechanism. Key to success of the EIS technique in describing the barrier oxide layer are: 1) the model and procedure used to fit EIS spectra, 2) the validation of the fit, and 3) converting circuit parameters (R, C and n) into physical attributes of the barrier oxide.

The barrier oxide is defined as the inner-dense layer adjacent to the metal-oxide interface. The integrity of barrier oxide is thought to effect both oxidation (i.e. access of water to the interface), and hydrogen pickup (i.e. failure hydrogen to escape away from the interface). Using EIS and the PEDRA application, the barrier oxide is described in terms of multiple independent dielectric responses to yield a unique 'micro-macro' picture of the barrier oxide that can be used to explain observed H pickup behavior.