Hostname: page-component-586b7cd67f-rdxmf Total loading time: 0 Render date: 2024-11-25T17:54:01.653Z Has data issue: false hasContentIssue false

Two-Wave Mixing Gain vs Intensity Dependence in Photorefractive GaAs:EL2 in Presence of Strong Electron/Hole Competition

Published online by Cambridge University Press:  21 February 2011

Philippe Gravey
Affiliation:
Centre National d'Etudes des Télécommunications, LAB/OCM/TAC Route de Trégastel BP 40 22301 Lannion, France.
Nicole Wolffer
Affiliation:
Centre National d'Etudes des Télécommunications, LAB/OCM/TAC Route de Trégastel BP 40 22301 Lannion, France.
Gilbert Picoli
Affiliation:
Centre National d'Etudes des Télécommunications, LAB/OCM/TAC Route de Trégastel BP 40 22301 Lannion, France.
Olivier Renais
Affiliation:
Centre National d'Etudes des Télécommunications, LAB/OCM/TAC Route de Trégastel BP 40 22301 Lannion, France.
Jean-Emmanuel Viallet
Affiliation:
Centre National d'Etudes des Télécommunications, LAB/OCM/TAC Route de Trégastel BP 40 22301 Lannion, France.
Get access

Abstract

We studied the pump intensity dependence of the 2WM gain in a photorefractive GaAs:EL2 crystal, with a 3.3 kV/cm d.c. field, at two different wavelengths. The grating period was 37 Am and the beam ratio was 4. At 1.32 μm, the characteristics exhibits a resonant behaviour (with a maximum of 0.23 cm-1). As for InP:Fe, these results can be explained by considering that thermally and optically generated carriers are of different types. The curve at 1.047 Am exhibits an original feature. At low intensities the gain as the same sign than at 1.32 μm (with a maximum of 0.12 cm-1), but the sign changes with increasing intensity and the gain tends towards an asymptotic value of -0.15 cm-1. Such behaviour may also be explained with the same model.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Picoli, G., Gravey, P., Ozkul, C. and Vieux, V., J.Appl.Phys. 66, 3798 (1989)Google Scholar
2. Ozkul, C., Picoli, G., Gravey, P. and Wolffer, N., Appl.Opt. 29, 2711 (1990)CrossRefGoogle Scholar
3. Millerd, J.E., Garmire, E.M. and Klein, M.B., Opt.Lett. 17, 100 (1992)Google Scholar
4. Partovi, A., Garmire, E.M., Valley, G.C. and Klein, M.B., Appl.Phys.Lett. 55, 2701 (1989)Google Scholar
5. Martin, G.M. and Makram-Ebeid, S., in Deep Level in Semiconductors, a State of the Art Approach, edited by Pantelides, S.T. (Gordon and Breach, New-York, 1986) pp.399487 Google Scholar
6. Valley, G.C., Bogges, T.F., Dubard, J. and Smirl, A.L., J.Appl.Phys. 66, 2407 (1989)Google Scholar
7. Chantre, A. and Bois, D., J.Phys.Soc.Suppl. A 49, 247 (1980)Google Scholar
8. Prinz, V.Ya. and Rechnukov, S.N. Phys.Stat.Sol.(b) 118, 159 (1983)Google Scholar
9. Valley, G.C., Rajbenbach, H. and von Bardeleben, H.J., in Technical Digest on Photorefractive Materials, Effects and Devices II, edited by Huignard, J.P. and Roosen, G. (Optical Society of America, Washington, D.C., 1990), p.29 Google Scholar
10. Look, D.C., Walters, D.C. and Meyer, J.R., Solid State Comm. 42, 745 (1982)Google Scholar