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Transparent Oxide Semiconductors Obtained by PLD

Published online by Cambridge University Press:  01 February 2011

Anna Vila
Affiliation:
[email protected], University of Barcelona, Electronics Department, Martí i Franqués 1, Barcelona, 08028, Spain
Antonis Olziersky
Affiliation:
[email protected], University of Barcelona, Electronics Department, Marti i Franques 1, Barcelona, 08028, Spain
Joaquim Font
Affiliation:
[email protected], University of Barcelona, Electronics Department, Marti i Franques 1, Barcelona, 08028, Spain
Teresa Andreu
Affiliation:
[email protected], University of Barcelona, Electronics Department, Marti i Franques 1, Barcelona, 08028, Spain
Erik Koep
Affiliation:
[email protected], University of Barcelona, Electronics Department, Marti i Franques 1, Barcelona, 08028, Spain
Juan Ramon Morante
Affiliation:
[email protected], University of Barcelona, Electronics Department, Marti i Franques 1, Barcelona, 08028, Spain
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Abstract

In this work we studied metaloxide films such as ZnO, In2O3-ZnO, In2O3-ZnO-ZrO2 and Ga2O3-In2O3-ZnO deposited by pulsed laser deposition on fused silica substrates at room temperature. Optical transmission measurements in the ultra violet – visible region showed that oxygen-rich atmospheres during deposition help to obtain more transparent films in the optical region while improving overall UV absorption transition related to the band gap. Less resistive films are produced in oxygen-rich atmospheres but an increase of oxygen pressure leads to higher resistivity films.

Type
Research Article
Copyright
Copyright © Materials Research Society 2008

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References

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