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Transmission Electron Microscopy Study of Epitaxial Co/Au and Co/Pd (111) Multilayers

Published online by Cambridge University Press:  25 February 2011

A.E.M. de Veirman
Affiliation:
Philips Research, P.O.Box 80.000, 5600 JA Eindhoven, The Netherlands
F. Hakkens
Affiliation:
Philips Research, P.O.Box 80.000, 5600 JA Eindhoven, The Netherlands
W. Coene
Affiliation:
Philips Research, P.O.Box 80.000, 5600 JA Eindhoven, The Netherlands
F.J.A. Den Broeder
Affiliation:
Philips Research, P.O.Box 80.000, 5600 JA Eindhoven, The Netherlands
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Abstract

The results of a transmission electron microscopy study of Co/Au and Co/Pd multilayers are reported. Special emphasis is put on the epitaxial growth and the relaxation of the misfit strain of these high misfit systems. In bright-field cross-sectional images, periodic contrast fringes are observed at the interfaces, which are the result of Moiré interference and which allow determination of the degree of misfit relaxation at the interface. It was established that 80-85% of the misfit is relaxed. From high resolution electron microscopy images the Burgers vector of the misfit dislocations was derived, being a/2<110> lying in the (111) interface plane. The results obtained for the Co/Au and Co/Pd multilayers will be discussed in comparison with those obtained for a bilayer of Co and Au.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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References

Refernces

1. Broeder, F.J.A. den, Hoving, W. and Bloemen, P.J.H., J. Magn. Magn. Mat. 93, 562 (1991)Google Scholar
2. Gao, Y., Shewmon, P.G. and Dregia, S.A., Acta Metall. 37, 3165 (1989)Google Scholar
3. Nandedkar, A.S., Srinivasan, G.R. and Murthy, C.S., Phys. Rev. B 43, 7308 (1991)Google Scholar
4. Merkle, K.L., Ultramicroscopy 37, 130 (1991)Google Scholar
5. Hakkens, F., Veirman, A.E.M. De, Coene, W. and Broeder, F.J.A. den, submitted to J. Mat. Res. (1992)Google Scholar
6. Gao, Y. and Merkle, K.L., J. Mater. Res. 5, 1995 (1990)Google Scholar
7. Renard, D. and Nihoul, G., Phil. Mag. B 55, 75 (1987)Google Scholar
8. Thdilen, A.R., Phys. Stat. Sol. A 2, 507 (1970)Google Scholar
9. Cherns, D. and Stowell, M.J., Thin Solid Films 29, 127 (1975)Google Scholar
10. Macur, J.E. and Vook, R.W., Thin Solid Films 66, 311 (1980)Google Scholar
11. Leamy, H.J., Gilmer, G.H. and Dirks, A.G., in Current Topics in Materials Science, Vol.6, edited by Kaldis, E. (North-Holland, Amsterdam, 1980), p. 309 Google Scholar
12. Hakkens, F., Coene, W. and Broeder, F.J.A. den, in Magnetic Thin Films. Multilayers and Surfaces, edited by Parkin, S.S.P. (Mat. Res. Soc. Symp. Proc. 231, Pittsburgh, PA, 1991) p.Google Scholar
13. Dirks, A.G., Wolters, R.A.M. and Veirman, A.E.M. De, Thin Solid Films 208, 181 (1992)Google Scholar
14. Schowalter, L.J., in Heteroepitaxy on Silicon: Fundamentals, Structure and Devices, edited by Choi, H.K., Hull, R., Ishiwara, H. and Nemanich, R.J. (Mat. Res. Soc. Symp. Proc. 231, Pittsburgh, PA, 1988) p. 3 Google Scholar
15. Jankowski, A.F., J. Appl. Phys. 71, 1782 (1992)Google Scholar
16. Matthews, J.W., Phil. Mag. 13, 1207 (1966)Google Scholar
17. Purcell, S.T., Kesteren, H.W. van, Cosman, E.C. and Hoving, W., J. Magn. Magn. Mat. 93, 25 (1990)Google Scholar
18. Merwe, J.H. van der, in Single Crystal Films, edited by Francombe, M.H. and Sato, H., (Pergamon Press, Oxford, 1964) p. 139 Google Scholar
19. Gilmore, C.M., Phys. Rev. B 40, 6402 (1989)Google Scholar