Hostname: page-component-586b7cd67f-gb8f7 Total loading time: 0 Render date: 2024-11-25T17:55:38.614Z Has data issue: false hasContentIssue false
  • English
  • Français

Transmission Electron Microscopy and Resistivity Measurements on Pd1−x Six Alloys Prepared by Ion Implantation.

Published online by Cambridge University Press:  15 February 2011

A. Traverse ,
M.O. Ruault ,
L. Mendoza-Zelis ,
M. Schack ,
H. Bernas ,
J. Chaumont  and
L. Dumoulin
A. Traverse
Affiliation:
Centre de Spectrométrie Nucléaire et de Spectrométrie de Masse, B.P. N° 1, F. 91406 Orsay.
M.O. Ruault
Affiliation:
Centre de Spectrométrie Nucléaire et de Spectrométrie de Masse, B.P. N° 1, F. 91406 Orsay.
L. Mendoza-Zelis
Affiliation:
Centre de Spectrométrie Nucléaire et de Spectrométrie de Masse, B.P. N° 1, F. 91406 Orsay. Visitor from Universidad de la Plata under a fellowship of CONICET (Republica Argentina).
M. Schack
Affiliation:
Centre de Spectrométrie Nucléaire et de Spectrométrie de Masse, B.P. N° 1, F. 91406 Orsay.
H. Bernas
Affiliation:
Centre de Spectrométrie Nucléaire et de Spectrométrie de Masse, B.P. N° 1, F. 91406 Orsay.
J. Chaumont
Affiliation:
Centre de Spectrométrie Nucléaire et de Spectrométrie de Masse, B.P. N° 1, F. 91406 Orsay.
L. Dumoulin
Affiliation:
Laboratoire de Physique des Solides, Université Paris XI, F. 91406 Orsay.
Get access

Abstract

After 6K implantation of Si in Pd films, resistivity measurements (previously reported (1)) had provided preliminary evidence that an amorphous state had been reached for a composition Pd.80 SiO 20· This result has been recently confirmed by transmission electron microscopy (TEM) observations : diffuse diffraction rings appear in the implanted part of the Pd film. New experiments are reported : - resistivity dose dependence (and temperature dependence) of a 300K Si implanted Pd film ; - in situ TEM experiments to follow the amorphization process during implantation.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 7 , 1981 , 217
Copyright
Copyright © Materials Research Society 1982

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1.Bernas, H., Traverse, A., Zawislak, F.C., Chaumont, J. and Dumoulin, L., J. Physique C 8, 41, 859 (1980).Google Scholar
2.Bernas, H. et al. , this conference.Google Scholar
3.Winterbon, K.B., Ion Implantation Range and Energy Deposition Distributions (Plenum, New York 1975).Google Scholar
4.Andonov, P., Université Paris XI (1979) Ph. D. Thesis, not published.Google Scholar
5.Sadoc, J.F., Dixmier, J. and Guinier, A., J. of Non Crystalline Solids, Vol. 12, No° 1, 46 (1973).Google Scholar
5aDixmier, J., J. Physique, C 4, 35, 11 (1974).Google Scholar
6.Marwick, A.D., Nucl. Instr. Meth. 182–183, 827 (1981).Google Scholar
7.Okamoto, P.R. and Wiedersich, H., J. Nucl. Mat. 53, 336 (1974).Google Scholar