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Transmission Characterization of Drilled Alternating-Layer Three-Dimensional Photonic Crystals

Published online by Cambridge University Press:  17 March 2011

Eiichi Kuramochi
Affiliation:
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi-shi, 243-0198, Japan
Masaya Notomi
Affiliation:
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi-shi, 243-0198, Japan
Itaru Yokohama
Affiliation:
NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi-shi, 243-0198, Japan
Jun-ichi Takahashi
Affiliation:
NTT Telecommunications Energy Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi-shi, 243-0198, Japan
Chiharu Takahashi
Affiliation:
NTT Telecommunications Energy Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi-shi, 243-0198, Japan NTT Advanced Technology Corporation, 3-1 Morinosato Wakamiya, Atsugi-shi, 243-0198, Japan
Takayuki Kawashima
Affiliation:
NICHe, Tohoku University, Aramaki Aza Aoba 04, Aoba-ku, Sendai, 980-8579, Japan
Shojiro Kawakami
Affiliation:
NICHe, Tohoku University, Aramaki Aza Aoba 04, Aoba-ku, Sendai, 980-8579, Japan
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Abstract

We propose a new three-dimensional photonic crystal structure or drilled alternating-layer photonic crystal (DALPC), which can be fabricated by a combination of the deposition of alternating layers of dielectric films and one-time dry etching. Our band calculation predicts that the DALPC has a photonic band gap (PBG) in all directions. We fabricated a Si/SiO2 DALPC by electron beam lithography, bias sputtering, and fluoride-gas electron cyclotron resonance etching. We measured the light transmission of the DALPC sample in both the in-plane and vertical directions. We observed a transmission minimum around the 1.4-µm-wavelength for all measured directions and TE/TM polarizations, which demonstrated a potential of the DALPC as a three-dimensional PBG material.

Type
Research Article
Copyright
Copyright © Materials Research Society 2002

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