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Top Layer Oxidation In Mo/SI Multilayer X-Ray Mirror

Published online by Cambridge University Press:  15 February 2011

Khanh Nguyen ,
Eric Gullikson  and
James Underwood
Khanh Nguyen
Affiliation:
Department of Electrical Engineering and Computer Science, University of California, Berkeley, CA 94720 Center for X-ray Optics, Lawrence Berkeley Laboratory, Berkeley, CA 94720
Eric Gullikson
Affiliation:
Center for X-ray Optics, Lawrence Berkeley Laboratory, Berkeley, CA 94720
James Underwood
Affiliation:
Center for X-ray Optics, Lawrence Berkeley Laboratory, Berkeley, CA 94720
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Abstract

Reflectivity of Mo/Si multilayer x-ray mirrors with molybdenum as the top layer decreased over time when stored in air due to oxidation of the top Mo layer to MoO3 and MoO2. High reflectivity can be maintained by having silicon as the top layer. In fact, reflectivity of Si-top multilayer coatings increase slightly during the first few days after deposition.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 306: Symposium K – Materials Aspects of X-Ray Lithography , 1993 , 135
Copyright
Copyright © Materials Research Society 1993

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References

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