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TiOxCy Thin Film Deposition by CO2+-Ion Beam Sputtering of Titanium

Published online by Cambridge University Press:  22 February 2011

BERTILO E. KEMPF
BERTILO E. KEMPF*
Affiliation:
Deutsche Telekom Forschungs- und Technologiezentrυm, P.O. 10 00 03, 64276 Darmstadt, Germany
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Abstract

Titanium metal is sputtered by ion beams using a Kaufman-type ion source with carbondioxide as working gas. Deposition takes place on watercooled substrates of silicon and InP. The films obtained are amorphous; they adhere excellently. SEM-pictures reveal a featureless dense fracture and a smooth surface. Despite a carbon content of 9 at % the films are highly transparent in the visible and near infrared wavelength range. Refractive indices center around 2.15 at values typically found for amorphous TiO2. The electrical properties are characterized by dielectric constant of ε = 26 ± 3, leakage current densities at breakdown of jL = 3.65 . 10-3 A/cm2 and breakdown fields EB > 1 MeV/cm.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 316: Symposium A – Materials Synthesis and Processing Using Ion Beams , 1993 , 917
Copyright
Copyright © Materials Research Society 1994

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References

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