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Time-resolved in-situ X-ray diffraction study of the formation of 3D-hexagonal mesoporous silica films

Published online by Cambridge University Press:  01 February 2011

D. Grosso ,
P.A. Albouy ,
H. Amenitsch ,
A.R. Balkenende  and
F. Babonneau
D. Grosso
Affiliation:
Chimie de la Matière Condensée, UPMC - CNRS, 4 place Jussieu, 75005 Paris, France
P.A. Albouy
Affiliation:
Lab. de Physique des Solides, Université Paris-Sud, 91405 Orsay, France
H. Amenitsch
Affiliation:
Institute of Biophysics and X-ray Structure Research, Austrian Academy of Sciences, Steyrergasse 17/VI, 8010 Graz, Austria.
A.R. Balkenende
Affiliation:
Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, Netherlands.
F. Babonneau
Affiliation:
Chimie de la Matière Condensée, UPMC - CNRS, 4 place Jussieu, 75005 Paris, France
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Abstract

Highly oriented 3D-hexagonal silica thin films have been produced on silicon substrates by dip-coating technique, using cetyltrimethylammonium (CTAB) bromide as structuring agent. For the first time, time-resolved in situ X-ray diffraction experiments have been used to investigate the formation of such mesostructured films. Interestingly, the data shows that an intermediate mesophase appears just after film deposition (t<500 ms), characterized by one diffraction peak centered at a d spacing of 65 Å. Then after 20 s, another mesophase appears with a shorter d spacing (44 Å), which corresponds to the 3D-hexagonal structure found for the final dried film.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 628: Symposium CC – Hybrid Organic/Inorganic Materials , 2000 , CC6.1
Copyright
Copyright © Materials Research Society 2000

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References

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