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Thin Film Transistors based on Microcrystalline Silicon on Polyimiide Substrates
Published online by Cambridge University Press: 15 February 2011
Abstract
This study reports on the fabrication of inverted gate TFT devices and circuits using a low temperature microcrystalline silicon deposition process compatible with polyimide substrates. Results from the electrical and material characterization of μ-Si:H based TFT's are presented. Device performance is compared with that of α-Si:H based TFT's constructed on polyimide. Results indicate that the anticipated improvement in device performance due to an increase in the α-Si:H Hall mobility (~10 cm2/V-sec) over that of α-Si:H (~1 cm2/V-sec) is not realized. Properties of μ-Si:H films are related to deposition parameters.
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- Copyright © Materials Research Society 1999