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Thin Film Stress Measurement with a Tunneling Sensor

Published online by Cambridge University Press:  10 February 2011

P. Zhang ,
R. P. Vinci ,
J. C. Bravman  and
T. W. Kenny
P. Zhang
Affiliation:
Department of Materials Science and Engineering, Stanford University, Stanford, CA 94305
R. P. Vinci
Affiliation:
Department of Materials Science and Engineering, Lehigh University, Bethlehem, PA 18015
J. C. Bravman
Affiliation:
Department of Materials Science and Engineering, Stanford University, Stanford, CA 94305
T. W. Kenny
Affiliation:
Department of Mechanical Engineering, Stanford University, Stanford, CA 94305
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Abstract

A new technique of measuring thin film stress with a tunneling sensor is presented. Basic measurement concepts, preliminary results on thin film stress measurement, and fabrication processes for the tunneling stress measurement sensor are described. The feasibility of implementing this technique for in-situ stress monitoring during thin film deposition demonstrated.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 546: Symposium AA – Materials Science of Microelectromechanical Systems (MEMS)… , 1998 , 45
Copyright
Copyright © Materials Research Society 1999

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References

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