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Thin Film Adhesion to Ion Bombarded Surfaces

Published online by Cambridge University Press:  21 February 2011

P. Anders Ingemarsson  and
T. A. Tombrello
P. Anders Ingemarsson
Affiliation:
Dept. of Radiation Sciences, Uppsala University, Box 535, S-751 21 Uppsala, Sweden
T. A. Tombrello
Affiliation:
California Institute of Technology, Pasadena, California 91125, U.S.A.
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Abstract

We report on the use of 20 MeV C14+ ion beams for pre-irradiation of Si, SiO2 and Al2O3 surfaces with resulting alterations in the adhesion of subsequently deposited Au and Ag thin films. The effect does not follow the same pattern for Au and Ag films, nor is there a simple correlation to the previously observed adhesion effect induced by ion irradiation after film deposition. Possible mechanisms, both for pre-irradiation and post-irradiation effects, are discussed, as is the importance of chemical structures with respect to interfacial bond strength.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 119: Symposium F – Adhesions in Solids , 1988 , 103
Copyright
Copyright © Materials Research Society 1988

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