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Thickness Measurement of Thin Films by X-Ray Absorption

Published online by Cambridge University Press:  21 February 2011

J. Chaudhuri  and
S. Shah
J. Chaudhuri
Affiliation:
The Wichita State university, Wichita, KS 67208
S. Shah
Affiliation:
The Wichita State university, Wichita, KS 67208
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Abstract

An x-ray diffraction method is described for determining thicknesses of thin films grown on single crystal substrates. The equations, based on the kinematical theory of x-ray diffraction and the mosaic crystal model, were developed. The thickness of the thin film was computed from the absorption of the integrated diffracted x-ray intensity from the single crystal substrate by the film. Since the diffracted intensity from the film is not required, the film does not have to be single crystal in nature. Thus, thicknesses of less ordered, polycrystalline or even amorphous films can be measured with high precision by this technique.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 161: Symposium E – Properties of II-VI Semiconductors: Bulk Crystals, Epitaxial Films, Quantum Well Structures, and Dilute Magnetic Systems , 1989 , 83
Copyright
Copyright © Materials Research Society 1990

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References

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