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Thickness Dependencies in the Calculated Properties of Metallic Ultra-Thin Films

Published online by Cambridge University Press:  10 February 2011

J. C. Boettger*
Affiliation:
Theoretical Division, Los Alamos National Laboratory, Los Alamos, NM 87545
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Abstract

Ultra-thin film (UTF) electronic structure calculations are a common tool for investigating surface properties. In this work, electronic structure calculations for A1(111) films ranging from one to twelve atoms thick are used to illustrate some of the difficulties that can arise when one attempts to determine surface properties of metals with UTF calculations.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

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