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Thermo-Electric Properties of Thin-Film Refractory Metal Thermocouples

Published online by Cambridge University Press:  16 February 2011

Robert G. Schinazi ,
Guo-Quan Lu  and
Frans Spaepen
Robert G. Schinazi
Affiliation:
Virginia Polytechnic Institute and State University, Blacksburg, VA 24061
Guo-Quan Lu
Affiliation:
Virginia Polytechnic Institute and State University, Blacksburg, VA 24061
Frans Spaepen
Affiliation:
Harvard University, Cambridge, MA 02138
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Abstract

Thin-film thermocouples are well suited for “smart” processes where the mass of traditional two-lead thermocouples inhibits their wide utilization. However, currentthin-film thermocouples lack the robustness desired for abrasive environments. To addressthis issue, thin-film refractory metal thermocouples consisting of combinations of molybdenum, tantalum, tungsten, vanadium, or nickel were produced by ion-beam sputtering on an alumina substrate. To speed up the process of sampling a large number of material combinations, the thermocouples were made small, about 200 nm thick, 2.5 mm wide, and 12 mm long. An apparatus was fabricated to measure the thermo-electric responses of these short-length thermocouples. Materials design and heat-transfer issues relating to the applicationsand testing of these thermocouples are discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 360 , 1994 , 145
Copyright
Copyright © Materials Research Society 1995

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References

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