Hostname: page-component-586b7cd67f-t7fkt Total loading time: 0 Render date: 2024-11-25T15:27:36.774Z Has data issue: false hasContentIssue false

Thermodynamic Analysis, a useful Tool for MOCVD

Published online by Cambridge University Press:  10 February 2011

C. Bernard
Affiliation:
INPG-ENSEEG-LTPCM, BP 75, F-38402 St.Martin d'Heres, France
A. Pisch
Affiliation:
INPG-ENSEEG-LTPCM, BP 75, F-38402 St.Martin d'Heres, France INPG-ENSPG- LMGP, BP 46, F-38402 St.Martin d'Heres, France
F. Weiss
Affiliation:
INPG-ENSPG- LMGP, BP 46, F-38402 St.Martin d'Heres, France
R. Madar
Affiliation:
INPG-ENSPG- LMGP, BP 46, F-38402 St.Martin d'Heres, France
Get access

Abstract

Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Research Article
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Hampden-Smith, M.J., Kodas, T.T., Chem. Vap. Deposition, 1, 8 (1995).Google Scholar
2. Schleich, D.M., in the Seven European Conference on Chemical Vapour Deposition Ed. By Ducarroir, M., Bernard, C. and Vandenbulke, L. (J. Phys. Coll. Sup. C5, 50, 1989), p. 961979.Google Scholar
3. Stringfellow, G.B., J. Electron. Mat., 17, 327 (1988).Google Scholar
4. Cowley, A.H., Jones, R.A., Angew. Chem. Int. Ed. Engl. 28, 1208 (1989).Google Scholar
5. Maury, F., Adv. Mat. 3, 542 (1991).Google Scholar
6. Maury, F., in the tenth European Conference on Chemical Vapour Deposition, Ed. By Battiston, G. (J. Phys. Coll. Sup. C5, 1995), p. 449463.Google Scholar
7. Slifirski, J., PhD Thesis, Université de Perpignan, 1993.Google Scholar
8. Fischer, H.E., Larkin, D.J., Interrante, L.V., Mat. Res. Soc. Bulletin, 16, 59 (1991).Google Scholar
9. Schuster, F., PhD Thesis, Institut National Polytechnique de Toulouse, 1990.Google Scholar
10. Schuster, F., Maury, F., Nowak, J.F., Bernard, C., Surf. Coatings Technol., 46, 275 (1991).Google Scholar
11. Sugiyama, K., Pac, S., Takamashi, Y., Motojima, S., J. Electrochem. Soc., 122, 1545 (1975).Google Scholar
12. Maury, F., Oquab, D., Manse, J.C., Morancho, R., Nowak, J.F., Gauthier, J.P., Surf. Coating Technol., 41, 51 (1990).Google Scholar
13. Rutherford, N.M., Larson, C.E., Jackson, R., Mat. Res. Soc. Proc., 131, 439 (1989).Google Scholar
14. Jimenez, C., Gilles, S., Bernard, C., Madar, R. to be published in Surf. Coatings Technol. (1995).Google Scholar
15. Bernard, C., Madar, R. in Chemical Vapor Deposition of Refractory Metals and Ceramics (II) Ed. by Besmann, T.M., Gallois, P.M. and Waren, J.W. (Mat. Res. Soc. Proc. 250, Pittsburg, PA, 1992) pp. 315.Google Scholar
16. Drouin-Ladouce, B., PhD Thesis, Université d'Orléans, 1990.Google Scholar
17. Weiss, F., Pisch, A., Bernard, C., Schmatz, U. in the tenth European Conference on Chemical Vapour Depositon Ed. by Battiston, G., (J. Phys. coll. sup. C5, 1995), p. 151–158.Google Scholar
18. Bernard, C., Weiss, F., Pisch, A., Madar, R., in Metal Organic Chemical Vapor Deposition of Electronic Ceramics, Ed. by Desu, S.B., Beach, D.B., Wessels, B.W. and Gokoglu, S. (Mat. Res. Soc. Proc. 335, Pittsburg, PA, 1994) pp. 139157.Google Scholar
19. Fröhlich, K., Weiss, F., Boursier, D., Sénateur, J.P., Physica C, 659, 235 (1993).Google Scholar
20. Pisch, A., PhD Thesis, Institut National Polytechnique de Grenoble, 1994.Google Scholar