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Thermodiffusion - A New Approach To Plasma Self-Confinement

Published online by Cambridge University Press:  15 February 2011

A. Forchel ,
B. Laurich  and
G. Mahler
A. Forchel
Affiliation:
Physikalisches Institut, Teil 4, Universität Stuttgart,
B. Laurich
Affiliation:
Physikalisches Institut, Teil 4, Universität Stuttgart,
G. Mahler
Affiliation:
Institut für theoretische Physik, Universität Stuttgart, Pfaffenwaldring 57, D–7000 Stuttgart 80, Germany
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Abstract

From a model for the thermodiffusion of high density plasmas an electronic mechanism for plasma self-confinement is derived. Due to the increase of the confinement densities with the density of states masses this effect should be most important in laser annealing experiments in Si but much weaker in GaAs. A fast diffusion of the surface generated plasma is found to enhance the impact ionization rate.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 13 , 1982 , 105
Copyright
Copyright © Materials Research Society 1983

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References

REFERENCES

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