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Thermal Stability of Precipitates in a Rapidly Quenched Ti-Al-Si Alloy*

Published online by Cambridge University Press:  21 February 2011

S.H. Wrang ,
Y.Z. Lu  and
B.C. Giessen
S.H. Wrang
Affiliation:
Materials Science Division, Barnett Institute of Chemical Analysis and Materials Science, Northeastern University, Boston, MA 02115
Y.Z. Lu
Affiliation:
Materials Science Division, Barnett Institute of Chemical Analysis and Materials Science, Northeastern University, Boston, MA 02115
B.C. Giessen
Affiliation:
Materials Science Division, Barnett Institute of Chemical Analysis and Materials Science, Northeastern University, Boston, MA 02115
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Abstract

Ostwald ripening of precipitates in rapidly solidified Ti- 5A1-2Si (wt.%) has been studied by TEM. Results show that particle coarsening at 700 and 800°C is controlled by volume diffusion. Diffusion coefficients of Si in a-Ti were found to be ˜7.5 × 10−13 cm2/sec at 700°C and ˜1.2 × 10−11 cm2 /sec at 800°C.At these temperatures, microstructural refinement due to rapid quenching had no noticeable effect on the coarsening mechanism for the RS Ti-5A1-2Si alloy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 28: Symposium F – Rapidly Solidified Metastable Materials , 1983 , 367
Copyright
Copyright © Materials Research Society 1984

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Footnotes

*

Contribution #192 from the Barnett Institute

References

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